In-situ x-ray diffraction study of the growth of highly strained epitaxial BaTiO{sub 3} thin films

Journal Article · Mon Dec 09 00:00:00 EST 2013 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4848779· OSTI ID:22217755

Sinsheimer, J.; Callori, S. J.; Ziegler, B.; Bein, B.; Dawber, M. ^[1]; Chinta, P. V.; Ashrafi, A.; Headrick, R. L. ^[2]

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1. Department of Physics and Astronomy, Stony Brook University, Stony Brook, New York 11794-3800 (United States)
2. Department of Physics, Cook Physical Science Building, University of Vermont, Burlington, Vermont 05405 (United States)

In-situ synchrotron x-ray diffraction was performed during the growth of BaTiO{sub 3} thin films on SrTiO{sub 3} substrates using both off-axis RF magnetron sputtering and pulsed laser deposition techniques. It was found that the films were ferroelectric during the growth process, and the presence or absence of a bottom SrRuO{sub 3} electrode played an important role in the growth of the films. Pulsed laser deposited films on SrRuO{sub 3} displayed an anomalously high tetragonality and unit volume, which may be connected to the previously predicted negative pressure phase of BaTiO{sub 3}.

• OSTI ID: 22217755
• Journal Information: Applied Physics Letters, Vol. 103, Issue 24; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
BARIUM COMPOUNDS
DEPOSITS
ELECTROCHEMISTRY
ELECTRODES
ENERGY BEAM DEPOSITION
EPITAXY
FERROELECTRIC MATERIALS
LASER RADIATION
LASERS
MAGNETRONS
PULSED IRRADIATION
SPUTTERING
STRAINS
STRONTIUM TITANATES
SUBSTRATES
THIN FILMS
X-RAY DIFFRACTION