Properties of Cu-doped ZnO films by RF sputtering method: Thickness dependence
- Pohang Accelerator Laboratory, Pohang University of Science and Technology, Pohang 790-784 (Korea, Republic of)
- Nano Materials Analysis Center, Korea Institute of Science and Technology, Seoul 136-791 (Korea, Republic of)
We present results concerning the thickness dependence of structural, morphological and optical properties of the Zn{sub 0.98}Cu{sub 0.02}O films deposited on glass substrates using radio frequency (RF) sputtering method. The microstructure and the chemical state of oxygen, copper and zinc in ZnO and Zn{sub 0.98}Cu{sub 0.02}O films were investigated by X-ray diffraction spectroscopy (XRD) and X-ray photoelectron spectroscopy (XPS), respectively. The results indicate that Zn{sub 0.98}Cu{sub 0.02}O films are the wurtzite structure with strong c-axis orientation. Crystallinity of the films is closely related to the film thickness. With increasing film thickness, there are more surface (mainly nanopores) defects existing in the Zn{sub 0.98}Cu{sub 0.02}O films and surface roughness increases. XRD and XPS data show that the valence state of copper in the Zn{sub 0.98}Cu{sub 0.02}O films is Cu{sup 2+}. The transparency of all films is more than 85% in the visible region.
- OSTI ID:
- 22215517
- Journal Information:
- Materials Research Bulletin, Vol. 47, Issue 10; Conference: IFFM2011: 2011 international forum on functional materials, Jeju Island (Korea, Republic of), 28-31 Jul 2011, AFM-2: 2. special symposium on advances in functional materials, Jeju Island (Korea, Republic of), 28-31 Jul 2011; Other Information: Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA); ISSN 0025-5408
- Country of Publication:
- United States
- Language:
- English
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