Formation of ultrasmooth thin silver films by pulsed laser deposition

Journal Article · Sun Sep 15 00:00:00 EDT 2013 · Crystallography Reports

DOI:https://doi.org/10.1134/S1063774513030097· OSTI ID:22210523

Kuznetsov, I. A.; Garaeva, M. Ya.; Grishchenko, Yu. V.; Zanaveskin, M. L. ^[1]

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1. NBIC Center, National Research Centre 'Kurchatov Institute' (Russian Federation)

Ultrasmooth thin silver films have been formed on a quartz substrate with a buffer yttrium oxide layer by pulsed laser deposition. The dependence of the surface morphology of the film on the gas (N{sub 2}) pressure in the working chamber and laser pulse energy is investigated. It is found that the conditions of film growth are optimal at a gas pressure of 10{sup -2} Torr and lowest pulse energy. The silver films formed under these conditions on a quartz substrate with an initial surface roughness of 0.3 nm had a surface roughness of 0.36 nm. These films can be used as a basis for various optoelectronics and nanoplasmonics elements.

• OSTI ID: 22210523
• Journal Information: Crystallography Reports, Vol. 58, Issue 5; Other Information: Copyright (c) 2013 Pleiades Publishing, Ltd.; http://www.springer-ny.com; Country of input: International Atomic Energy Agency (IAEA); ISSN 1063-7745
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ENERGY BEAM DEPOSITION
FILMS
LASER RADIATION
LASERS
LAYERS
MORPHOLOGY
PULSED IRRADIATION
PULSES
QUARTZ
ROUGHNESS
SILVER
SUBSTRATES
SURFACES
YTTRIUM OXIDES