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Title: Properties of pulsed laser deposited fluorinated hydroxyapatite films on titanium

Journal Article · · Materials Research Bulletin
 [1];  [2];  [3];  [2];  [3]; ;  [4];  [3];  [1]
  1. A.A. Baikov Institute of Metallurgy and Materials Science, Russian Academy of Sciences, Leninsky Prospect 49, 119991 Moscow (Russian Federation)
  2. Istituto di Struttura della Materia, Consiglio Nazionale delle Ricerche, Via Salaria km 29.300, 00016 Monterotondo Scalo (RM) (Italy)
  3. Istituto di Struttura della Materia, Consiglio Nazionale delle Ricerche, Via del Fosso del Cavaliere 100, 00133 Rome (Italy)
  4. Istituto per lo Studio dei Materiali Nanostrutturati, Consiglio Nazionale delle Ricerche, Piazzale Aldo Moro 5, 00185 Rome (Italy)

Fluorinated hydroxyapatite coated titanium was investigated for application as implant coating for bone substitute materials in orthopaedics and dentistry. Pulsed laser deposition technique was used for films preparation. Fluorinated hydroxyapatite target composition, Ca{sub 10}(PO{sub 4}){sub 6}F{sub 1.37}(OH){sub 0.63}, was maintained at 2 J/cm{sup 2} of laser fluence and 500-600 {sup o}C of the substrate temperature. Prepared films had a compact microstructure, composed of spherical micrometric-size aggregates. The average surface roughness resulted to be of 3 nm for the film grown at 500 {sup o}C and of 10 nm for that grown at 600 {sup o}C, showing that the temperature increase did not favour the growth of a more fine granulated surface. The films were polycrystalline with no preferential growth orientation. The films grown at 500-600 {sup o}C were about 8 {mu}m thick and possessed a hardness of 12-13 GPa. Lower or higher substrate temperature provides the possibility to obtain coatings with different fine texture and roughness, thus tayloring them for various applications.

OSTI ID:
22207391
Journal Information:
Materials Research Bulletin, Vol. 45, Issue 9; Other Information: Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA); ISSN 0025-5408
Country of Publication:
United States
Language:
English