Damage of multilayer optics with varying capping layers induced by focused extreme ultraviolet beam

Journal Article · Tue May 28 00:00:00 EDT 2013 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.4807644· OSTI ID:22162974

Jody Corso, Alain; Nicolosi, Piergiorgio; Nardello, Marco; Guglielmina Pelizzo, Maria ^[1]; Zuppella, Paola ^[1]; Barkusky, Frank ^[2]; Mann, Klaus; Mueller, Matthias ^[2]

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1. National Research Council of Italy, Institute for Photonics and Nanotechnology, via Trasea 7, 35131 Padova (Italy)
2. Laser-Laboratorium Goettingen e.V, Goettingen (Germany)

Extreme ultraviolet Mo/Si multilayers protected by capping layers of different materials were exposed to 13.5 nm plasma source radiation generated with a table-top laser to study the irradiation damage mechanism. Morphology of single-shot damaged areas has been analyzed by means of atomic force microscopy. Threshold fluences were evaluated for each type of sample in order to determine the capability of the capping layer to protect the structure underneath.

• OSTI ID: 22162974
• Journal Information: Journal of Applied Physics, Vol. 113, Issue 20; Other Information: (c) 2013 Copyright-Sign 2013 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ATOMIC FORCE MICROSCOPY
BEAMS
COVERINGS
DAMAGE
EXTREME ULTRAVIOLET RADIATION
IRRADIATION
LASER RADIATION
LAYERS
MOLYBDENUM
OPTICS
PLASMA
SILICON
SURFACES