Excitation dependent two-component spontaneous emission and ultrafast amplified spontaneous emission in dislocation-free InGaN nanowires
- Department of Engineering Science and Mechanics, The Penn State University, University Park, Pennsylvania 16802 (United States)
- Center for Nanoscale Photonics and Spintronics, University of Michigan, Ann Arbor, Michigan 48109 (United States)
- Department of Physics and Astronomy, Middle Tennessee State University, Murfreesboro, Tennessee 37132 (United States)
Amplified spontaneous emission (ASE) at 456 nm from In{sub 0.2}Ga{sub 0.8}N nanowires grown on (001) silicon by catalyst-free molecular beam epitaxy was observed at room temperature under femtosecond excitation. The photoluminescence spectra below ASE threshold consist of two spontaneous emission bands centered at {approx}555 nm and {approx}480 nm, respectively, revealing the co-existence of deeply and shallowly localized exciton states in the nanowires. The ASE peak emerges from the 480 nm spontaneous emission band when the excitation density exceeds {approx}120 {mu}J/cm{sup 2}, indicating that optical gain arises from the radiative recombination of shallowly localized excitons in the nanowires. Time-resolved photoluminescence measurements revealed that the ASE process completes within 1.5 ps, suggesting a remarkably high stimulated emission recombination rate in one-dimensional InGaN nanowires.
- OSTI ID:
- 22162771
- Journal Information:
- Applied Physics Letters, Vol. 102, Issue 9; Other Information: (c) 2013 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
CATALYSTS
DISLOCATIONS
EXCITATION
EXCITONS
GALLIUM COMPOUNDS
INDIUM COMPOUNDS
MOLECULAR BEAM EPITAXY
NITROGEN COMPOUNDS
ONE-DIMENSIONAL CALCULATIONS
PHOTOLUMINESCENCE
QUANTUM WIRES
RECOMBINATION
SEMICONDUCTOR MATERIALS
SILICON
SPECTRA
SUPERRADIANCE
TEMPERATURE RANGE 0273-0400 K
TIME RESOLUTION