Different properties of aluminum doped zinc oxide nanostructured thin films prepared by radio frequency magnetron sputtering

Journal Article · Sat Jun 15 00:00:00 EDT 2013 · Semiconductors

DOI:https://doi.org/10.1134/S1063782613060043· OSTI ID:22126512

Bidmeshkipour, Samina; Shahtahmasebi, Nasser ^[1]

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1. Ferdowsi University of Mashhad, Department of Physics (Iran, Islamic Republic of)

Aluminium doped zinc oxide (AZO) nanostructured thin films are prepared by radio frequency magnetron sputtering on glass substrate using specifically designed ZnO target containing different amount of Al{sub 2}O{sub 3} powder as the Al doping source. The optical properties of the aluminium doped zinc oxide films are investigated. The topography of the deposited films were investigated by Atomic Force Microscopy. Variation of the refractive index by annealing temperature are considered and it is seen that the refractive index increases by increasing the annealing temperature.

• OSTI ID: 22126512
• Journal Information: Semiconductors, Vol. 47, Issue 6; Other Information: Copyright (c) 2013 Pleiades Publishing, Ltd.; Country of input: International Atomic Energy Agency (IAEA); ISSN 1063-7826
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ALUMINIUM
ALUMINIUM OXIDES
ANNEALING
ATOMIC FORCE MICROSCOPY
DEPOSITS
DESIGN
DOPED MATERIALS
GLASS
MAGNETRONS
NANOSTRUCTURES
POWDERS
RADIOWAVE RADIATION
REFRACTIVE INDEX
SPUTTERING
THIN FILMS
TOPOGRAPHY
ZINC OXIDES