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Title: Effect of electron energy distribution functions on plasma generated vacuum ultraviolet in a diffusion plasma excited by a microwave surface wave

Plasma generated vacuum ultraviolet (VUV) in diffusion plasma excited by a microwave surface wave has been studied by using dielectric-based VUV sensors. Evolution of plasma VUV in the diffusion plasma as a function of the distance from the power coupling surface is investigated. Experimental results have indicated that the energy and spatial distributions of plasma VUV are mainly controlled by the energy distribution functions of the plasma electrons, i.e., electron energy distribution functions (EEDFs). The study implies that by designing EEDF of plasma, one could be able to tailor plasma VUV in different applications such as in dielectric etching or photo resist smoothing.
Authors:
; ; ;  [1] ;  [2] ;  [3]
  1. Austin Plasma Laboratory, Tokyo Electron America, Inc., Austin, Texas 78741 (United States)
  2. Tokyo Electron Limited, TEL Technology Center Sendai, 2-1 Osawa 3-chome, Izumi-ku, Sendai 981-3137 (Japan)
  3. Institute of Fluid Science, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577 (Japan)
Publication Date:
OSTI Identifier:
22122817
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 103; Journal Issue: 3; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; DESIGN; DIELECTRIC MATERIALS; DIFFUSION; ENERGY SPECTRA; EVOLUTION; EXCITED STATES; FAR ULTRAVIOLET RADIATION; LIGHT TRANSMISSION; MICROWAVE RADIATION; PLASMA DIAGNOSTICS; SENSORS; SPATIAL DISTRIBUTION; SURFACES; WAVE PROPAGATION