SciTech Connect

Title: Oxidation behavior of arc evaporated Al-Cr-Si-N thin films

Oxidation behavior of arc evaporated Al-Cr-Si-N thin films The impact of Al and Si on the oxidation behavior of Al-Cr-(Si)-N thin films synthesized by arc evaporation of powder metallurgically prepared Al{sub x}Cr{sub 1-x} targets with x = Al/(Al + Cr) of 0.5, 0.6, and 0.7 and (Al{sub 0.5}Cr{sub 0.5}){sub 1-z}Si{sub z} targets with Si contents of z = 0.05, 0.1, and 0.2 in N{sub 2} atmosphere was studied in detail by means of differential scanning calorimetry, thermogravimetric analysis (TGA), x-ray diffraction, and Raman spectroscopy. Dynamical measurements in synthetic air (up to 1440 Degree-Sign C) revealed the highest onset temperature of pronounced oxidation for nitride coatings prepared from the Al{sub 0.4}Cr{sub 0.4}Si{sub 0.2} target. Isothermal TGA at 1100, 1200, 1250, and 1300 Degree-Sign C highlight the pronounced improvement of the oxidation resistance of Al{sub x}Cr{sub 1-x}N coatings by the addition of Si. The results show that Si promotes the formation of a dense coating morphology as well as a dense oxide scale when exposed to air.
Authors: ; ; ; ; ; ; ; ;
Publication Date:
OSTI Identifier:OSTI ID: 22099110
Resource Type:Journal Article
Resource Relation:Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 30; Journal Issue: 6; Other Information: (c) 2012 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:United States
Language:English
Subject: 36 MATERIALS SCIENCE; 46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; AIR; ALUMINIUM; ALUMINIUM COMPOUNDS; CALORIMETRY; CHROMIUM COMPOUNDS; CONTROLLED ATMOSPHERES; MORPHOLOGY; NITROGEN; OXIDATION; POWDER METALLURGY; PROTECTIVE COATINGS; RAMAN SPECTROSCOPY; SILICON; SILICON COMPOUNDS; THERMAL GRAVIMETRIC ANALYSIS; THIN FILMS; X-RAY DIFFRACTION