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Title: An instrument for 3D x-ray nano-imaging

Abstract

We present an instrument dedicated to 3D scanning x-ray microscopy, allowing a sample to be precisely scanned through a beam while the angle of x-ray incidence can be changed. The position of the sample is controlled with respect to the beam-defining optics by laser interferometry. The instrument achieves a position stability better than 10 nm standard deviation. The instrument performance is assessed using scanning x-ray diffraction microscopy and we demonstrate a resolution of 18 nm in 2D imaging of a lithographic test pattern while the beam was defined by a pinhole of 3 {mu}m in diameter. In 3D on a test object of copper interconnects of a microprocessor, a resolution of 53 nm is achieved.

Authors:
; ; ; ; ; ;  [1]
  1. Paul Scherrer Institut, 5232 Villigen PSI (Switzerland)
Publication Date:
OSTI Identifier:
22093667
Resource Type:
Journal Article
Journal Name:
Review of Scientific Instruments
Additional Journal Information:
Journal Volume: 83; Journal Issue: 7; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0034-6748
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; BEAMS; INTERFEROMETRY; MICROPROCESSORS; MICROSCOPY; PERFORMANCE; STABILITY; X RADIATION; X-RAY DIFFRACTION

Citation Formats

Holler, M., Raabe, J., Diaz, A., Guizar-Sicairos, M., Quitmann, C., Menzel, A., and Bunk, O. An instrument for 3D x-ray nano-imaging. United States: N. p., 2012. Web. doi:10.1063/1.4737624.
Holler, M., Raabe, J., Diaz, A., Guizar-Sicairos, M., Quitmann, C., Menzel, A., & Bunk, O. An instrument for 3D x-ray nano-imaging. United States. https://doi.org/10.1063/1.4737624
Holler, M., Raabe, J., Diaz, A., Guizar-Sicairos, M., Quitmann, C., Menzel, A., and Bunk, O. 2012. "An instrument for 3D x-ray nano-imaging". United States. https://doi.org/10.1063/1.4737624.
@article{osti_22093667,
title = {An instrument for 3D x-ray nano-imaging},
author = {Holler, M. and Raabe, J. and Diaz, A. and Guizar-Sicairos, M. and Quitmann, C. and Menzel, A. and Bunk, O.},
abstractNote = {We present an instrument dedicated to 3D scanning x-ray microscopy, allowing a sample to be precisely scanned through a beam while the angle of x-ray incidence can be changed. The position of the sample is controlled with respect to the beam-defining optics by laser interferometry. The instrument achieves a position stability better than 10 nm standard deviation. The instrument performance is assessed using scanning x-ray diffraction microscopy and we demonstrate a resolution of 18 nm in 2D imaging of a lithographic test pattern while the beam was defined by a pinhole of 3 {mu}m in diameter. In 3D on a test object of copper interconnects of a microprocessor, a resolution of 53 nm is achieved.},
doi = {10.1063/1.4737624},
url = {https://www.osti.gov/biblio/22093667}, journal = {Review of Scientific Instruments},
issn = {0034-6748},
number = 7,
volume = 83,
place = {United States},
year = {Sun Jul 15 00:00:00 EDT 2012},
month = {Sun Jul 15 00:00:00 EDT 2012}
}