Control of ion density distribution by magnetic traps for plasma electrons
- Plasma Laboratory, National Aerospace University 'KhAI,' Kharkov 61070 (Ukraine)
- Plasma Nanoscience Centre Australia (PNCA), CSIRO Materials Science and Engineering, P.O. Box 218, Lindfield, New South Wales 2070 (Australia)
- Jozef Stefan Institute, Jamova cesta 39, SI-1000 Ljubljana (Slovenia)
The effect of a magnetic field of two magnetic coils on the ion current density distribution in the setup for low-temperature plasma deposition is investigated. The substrate of 400 mm diameter is placed at a distance of 325 mm from the plasma duct exit, with the two magnetic coils mounted symmetrically under the substrate at a distance of 140 mm relative to the substrate centre. A planar probe is used to measure the ion current density distribution along the plasma flux cross-sections at distances of 150, 230, and 325 mm from the plasma duct exit. It is shown that the magnetic field strongly affects the ion current density distribution. Transparent plastic films are used to investigate qualitatively the ion density distribution profiles and the effect of the magnetic field. A theoretical model is developed to describe the interaction of the ion fluxes with the negative space charge regions associated with the magnetic trapping of the plasma electrons. Theoretical results are compared with the experimental measurements, and a reasonable agreement is demonstrated.
- OSTI ID:
- 22089469
- Journal Information:
- Journal of Applied Physics, Vol. 112, Issue 7; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
Similar Records
Formation of Ion Beam from High Density Plasma of ECR Discharge
Effects of temperature and near-substrate plasma density on the structural and electrical properties of dc sputtered germanium thin films