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Title: Optical properties of InGaPN epilayer with low nitrogen content grown by molecular beam epitaxy

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4752270· OSTI ID:22089450
 [1]; ; ; ; ;  [1]
  1. Institute of Scientific and Industrial Research, Osaka University, 8-1, Mihogaoka, Ibaraki, Osaka 567-0047 (Japan)

The effect of nitrogen concentration on the optical properties of InGaP(N) epilayer was investigated. The temperature dependence of the photoluminescence (PL) peak energy of InGaPN (N = 1%) epilayer around room temperature was found to be almost one-half of that of InGaP epilayer. The incorporation of N causes the reduction of the coupling constant for the electron-phonon interaction, leading to the reduced temperature dependence of the PL peak shift. Thermal activation energy, which is deduced from the Arrhenius plot of PL intensity, was decreased by N incorporation. The reduced PL quenching is discussed in terms of the changes in the band alignment at the InGaPN/GaAs heterointerface by the increase in the N concentration.

OSTI ID:
22089450
Journal Information:
Journal of Applied Physics, Vol. 112, Issue 6; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Country of Publication:
United States
Language:
English