skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Impact of screening of resonant magnetic perturbations in three dimensional edge plasma transport simulations for DIII-D

Journal Article · · Physics of Plasmas
DOI:https://doi.org/10.1063/1.4714616· OSTI ID:22072339
; ;  [1];  [2];  [3];  [4];  [5]
  1. Institute of Energy and Climate Research-Plasma Physics, Forschungszentrum Juelich GmbH, Association EURATOM-FZJ, Partner in the Trilateral Euregio Cluster, Juelich (Germany)
  2. Institute of Plasma Physics AS CR, v.v.i., Association EURATOM/IPP.CR, Prague (Czech Republic)
  3. General Atomics, P.O. Box 85608, San Diego, California 92186-5608 (United States)
  4. Max-Planck Institute for Plasma Physics, Greifswald (Germany)
  5. Association EURATOM-CEA, IRFM, CEA Cadarache, St-Paul-lez-Durance (France)

The impact of resonant magnetic perturbations (RMPs) on the plasma edge can be analyzed in detail by three dimensional computer simulations, which take the underlying magnetic field structure as input. Previously, the 'vacuum approximation' has been used to calculate the magnetic field structure although plasma response effects may result in a screening (or even an amplification) of the external perturbations. Simulation results for an ITER similar shape plasma at the DIII-D tokamak are presented for the full vacuum perturbation field and an ad hoc screening case in comparison to the unperturbed configuration. It is shown that the RMP induced helical patterns in the plasma edge and on the divertor target shrink once screening is taken into account. However, a flat temperature profile is still found in the 'open field line domain' inside the separatrix, while the 'density pump out effect' found in the vacuum RMP case is considerably weakened.

OSTI ID:
22072339
Journal Information:
Physics of Plasmas, Vol. 19, Issue 5; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 1070-664X
Country of Publication:
United States
Language:
English