TEM characterization of Au-based alloys to join YSZ to steel for SOFC applications
- National Nano Device Laboratories, Hsinchu 300, Taiwan (China)
- Ohio Aerospace Institute, Cleveland, OH 44142 (United States)
- Engineering and Technology Department, University of Wisconsin-Stout, Menomonie, WI 54751 (United States)
The microstructures of two gold-based alloys with compositions (in wt.%) of 96.4Au-3Ni-0.6Ti and 97.5Au-0.75Ni-1.75V following oxidation at 850 Degree-Sign C for 200 min were characterized by analytical transmission electron microscopy with energy dispersive spectroscopy and by scanning electron microscopy. In the oxidized 96.4Au-3Ni-0.6Ti interlayer, a dense scale composed of nickel oxide (NiO) and nickel titanate (NiTiO{sub 3}) formed at the alloy surface. No evidence of titanium oxide was found because there was not enough Ti present to form titanium oxide. In the oxidized 97.5Au-0.75Ni-1.75V interlayer, loose vanadium oxide (V{sub 2}O{sub 5}) and nickel vanadate (Ni{sub 2}V{sub 2}O{sub 7}) formed and were distributed within the oxidized 97.5Au-0.75Ni-1.75V interlayer. Similarly, because of the low Ni content in the alloys, no NiO formed. The oxide products in the 96.4Au-3Ni-0.6Ti and 97.5Au-0.75Ni-1.75V interlayers after oxidation are consistent with the Pilling-Bedworth (PB) ratio considerations. - Highlights: Black-Right-Pointing-Pointer Two commercial Au-based reactive metallic interlayers were oxidized at 850 Degree-Sign C for 200 min. Black-Right-Pointing-Pointer The oxidized products at the surface were characterized by TEM/EDS and SEM. Black-Right-Pointing-Pointer NiO and NiTiO{sub 3} formed at the oxidized 96.4Au-3Ni-0.6Ti interlayer. Black-Right-Pointing-Pointer V{sub 2}O{sub 5} and Ni{sub 2}V{sub 2}O{sub 7} were found in the oxidized 97.5Au-0.75Ni-1.75V interlayer. Black-Right-Pointing-Pointer These oxide products are consistent with the Pilling-Bedworth (PB) ratio considerations.
- OSTI ID:
- 22066412
- Journal Information:
- Materials Characterization, Vol. 63, Issue Complete; Other Information: Copyright (c) 2011 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA); ISSN 1044-5803
- Country of Publication:
- United States
- Language:
- English
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