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Title: Effect of fast positive ions incident on caesiated plasma grid of negative ion source

Journal Article · · Review of Scientific Instruments
DOI:https://doi.org/10.1063/1.3656076· OSTI ID:22063907
 [1]
  1. LPP, Ecole Polytechnique, Palaiseau, UPMC, Universite PARIS-SUD 11, UMR CNRS 7648 (France)

This paper describes the effect on negative ion formation on a caesiated surface of the backscattering of positive ions approaching it with energy of a few tens of eV. For a positive ion energy of 45 eV, the surface produced negative ion current density due to these fast positive ions is 12 times larger than that due to thermal atoms, thus dominating the negative ion surface production instead of the thermal atoms, as considered until now.

OSTI ID:
22063907
Journal Information:
Review of Scientific Instruments, Vol. 83, Issue 2; Conference: ICIS 2011: 14. international conference on ion sources, Giardini-Naxos, Sicily (Italy), 12-16 Sep 2011; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
Country of Publication:
United States
Language:
English

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