Radio frequency discharge with control of plasma potential distribution
- Muons, Inc., Batavia, Illinois 60510 (United States)
- BINP, Novosibirsk 63090 (Russian Federation)
A RF discharge plasma generator with additional electrodes for independent control of plasma potential distribution is proposed. With positive biasing of this ring electrode relative end flanges and longitudinal magnetic field a confinement of fast electrons in the discharge will be improved for reliable triggering of pulsed RF discharge at low gas density and rate of ion generation will be enhanced. In the proposed discharge combination, the electron energy is enhanced by RF field and the fast electron confinement is improved by enhanced positive plasma potential which improves the efficiency of plasma generation significantly. This combination creates a synergetic effect with a significantly improving the plasma generation performance at low gas density. The discharge parameters can be optimized for enhance plasma generation with acceptable electrode sputtering.
- OSTI ID:
- 22063881
- Journal Information:
- Review of Scientific Instruments, Vol. 83, Issue 2; Conference: ICIS 2011: 14. international conference on ion sources, Giardini-Naxos, Sicily (Italy), 12-16 Sep 2011; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
- Country of Publication:
- United States
- Language:
- English
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