Visible light-induced photocatalytic properties of WO{sub 3} films deposited by dc reactive magnetron sputtering

Journal Article · Tue May 15 00:00:00 EDT 2012 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films

DOI:https://doi.org/10.1116/1.3696876· OSTI ID:22054159

Imai, Masahiro; Kikuchi, Maiko; Oka, Nobuto; Shigesato, Yuzo ^[1]

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1. Graduate School of Science and Engineering, Aoyama Gakuin University, 5-10-11 Fuchinobe, Chyuou-ku, Sagamihara, Kanagawa 252-8258 (Japan)

The authors examined the photocatalytic activity of WO{sub 3} films (thickness 500-600 nm) deposited on a fused quartz substrate heated at 350-800 deg. C by dc reactive magnetron sputtering using a W metal target under the O{sub 2} gas pressure from 1.0 to 5.0 Pa. Films deposited at 800 deg. C under 5.0 Pa have excellent crystallinity of triclinic, P1(1) structure and a large surface area, as confirmed by x-ray diffraction, scanning electron microscopy, and atomic force microscopy. Exposure of acetaldehyde (CH{sub 3}CHO) adsorbed onto the film surface to ultraviolet, visible, or standard fluorescence light induces oxidative photocatalytic decomposition indicated by a decrease in CH{sub 3}CHO concentration and generation of CO{sub 2} gas. For all three types of irradiation, concentration ratio of decreased CH{sub 3}CHO to increased CO{sub 2} is about 1:1, suggesting the possible presence of intermediates. The sputter-deposited WO{sub 3} film can be a good candidate as a visible light-responsive photocatalyst.

• OSTI ID: 22054159
• Journal Information: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Vol. 30, Issue 3; Other Information: (c) 2012 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1553-1813
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ACETALDEHYDE
ATOMIC FORCE MICROSCOPY
CARBON DIOXIDE
CONCENTRATION RATIO
CRYSTAL STRUCTURE
DEPOSITION
FLUORESCENCE
MAGNETRONS
OXIDATION
PHOTOCATALYSIS
QUARTZ
SCANNING ELECTRON MICROSCOPY
SPUTTERING
SURFACE AREA
THIN FILMS
TUNGSTEN OXIDES
VISIBLE RADIATION
X-RAY DIFFRACTION