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Title: Temperature threshold for nanorod structuring of metal and oxide films grown by glancing angle deposition

Abstract

Thin films of tin (Sn), aluminum (Al), gold (Au), ruthenium (Ru), tungsten (W), ruthenium dioxide (RuO{sub 2}), tin dioxide (SnO{sub 2}), and tungsten trioxide (WO{sub 3}) were grown by glancing angle deposition (GLAD) to determine the nanostructuring temperature threshold, {Theta}{sub T}, above which adatom surface diffusion becomes large enough such that nanorod morphology is no longer formed during growth. The threshold was found to be lower in metals compared to oxides. Films were grown using both dc and pulsed dc magnetron sputtering with continuous substrate rotation over the temperature range from 291 to 866 K. Film morphologies, structures, and compositions were characterized by high resolution scanning electron microscopy, x-ray diffraction, and x-ray photoelectron spectroscopy. Films were also grown in a conventional configuration for comparison. For elemental metals, nanorod structuring occurs for films with melting points higher than that of Al (933 K) when grown at room temperature with a rotation rate of {approx}5 rpm, corresponding to a value of {Theta}{sub T}{approx_equal}0.33{+-}0.01. For the oxide films, a value of {Theta}{sub T}{approx_equal}0.5 was found, above which GLAD nanorod structuring does not occur. The existence of a nanostructuring temperature threshold in both metal and oxide GLAD films can be attributed to greater adatommore » mobilities as temperature is increased resulting in nonkinetically limited film nucleation and growth processes.« less

Authors:
;  [1]
  1. Laboratory for Surface Science and Technology, University of Maine, Orono, Maine 04469-5708 (United States)
Publication Date:
OSTI Identifier:
22054016
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films
Additional Journal Information:
Journal Volume: 29; Journal Issue: 1; Other Information: (c) 2011 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 1553-1813
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ALUMINIUM; CRYSTAL GROWTH; DEPOSITION; GOLD; MAGNETRONS; MELTING POINTS; NANOSTRUCTURES; NUCLEATION; PARTICLE MOBILITY; RUTHENIUM; RUTHENIUM OXIDES; SCANNING ELECTRON MICROSCOPY; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; TIN OXIDES; TUNGSTEN OXIDES; X-RAY DIFFRACTION; X-RAY PHOTOELECTRON SPECTROSCOPY

Citation Formats

Deniz, Derya, and Lad, Robert J. Temperature threshold for nanorod structuring of metal and oxide films grown by glancing angle deposition. United States: N. p., 2011. Web. doi:10.1116/1.3525882.
Deniz, Derya, & Lad, Robert J. Temperature threshold for nanorod structuring of metal and oxide films grown by glancing angle deposition. United States. https://doi.org/10.1116/1.3525882
Deniz, Derya, and Lad, Robert J. 2011. "Temperature threshold for nanorod structuring of metal and oxide films grown by glancing angle deposition". United States. https://doi.org/10.1116/1.3525882.
@article{osti_22054016,
title = {Temperature threshold for nanorod structuring of metal and oxide films grown by glancing angle deposition},
author = {Deniz, Derya and Lad, Robert J},
abstractNote = {Thin films of tin (Sn), aluminum (Al), gold (Au), ruthenium (Ru), tungsten (W), ruthenium dioxide (RuO{sub 2}), tin dioxide (SnO{sub 2}), and tungsten trioxide (WO{sub 3}) were grown by glancing angle deposition (GLAD) to determine the nanostructuring temperature threshold, {Theta}{sub T}, above which adatom surface diffusion becomes large enough such that nanorod morphology is no longer formed during growth. The threshold was found to be lower in metals compared to oxides. Films were grown using both dc and pulsed dc magnetron sputtering with continuous substrate rotation over the temperature range from 291 to 866 K. Film morphologies, structures, and compositions were characterized by high resolution scanning electron microscopy, x-ray diffraction, and x-ray photoelectron spectroscopy. Films were also grown in a conventional configuration for comparison. For elemental metals, nanorod structuring occurs for films with melting points higher than that of Al (933 K) when grown at room temperature with a rotation rate of {approx}5 rpm, corresponding to a value of {Theta}{sub T}{approx_equal}0.33{+-}0.01. For the oxide films, a value of {Theta}{sub T}{approx_equal}0.5 was found, above which GLAD nanorod structuring does not occur. The existence of a nanostructuring temperature threshold in both metal and oxide GLAD films can be attributed to greater adatom mobilities as temperature is increased resulting in nonkinetically limited film nucleation and growth processes.},
doi = {10.1116/1.3525882},
url = {https://www.osti.gov/biblio/22054016}, journal = {Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films},
issn = {1553-1813},
number = 1,
volume = 29,
place = {United States},
year = {Sat Jan 15 00:00:00 EST 2011},
month = {Sat Jan 15 00:00:00 EST 2011}
}