Effects of deposition and annealing temperatures on the electrical and optical properties of Ag{sub 2}O and Cu{sub 2}O-Ag{sub 2}O thin films
- Department of Materials Science and Engineering, National Chung Hsing University, Taichung 402, Taiwan (China)
Ag{sub 2}O and Ag{sub 2}O-Cu{sub 2}O films were deposited on glass substrates by magnetron sputtering of Ag and Cu targets at various substrate temperatures. After deposition, some of these films were annealed using a rapid thermal annealing system, with the variation of temperature. An UV-VIS-NIR photometer and a Hall measurement system were used to characterize the optical and electrical properties of these films. On annealing, Ag{sub 2}O (hexagonal) phase would slowly change to Ag+Ag{sub 2}O (cubic) phases when the annealing temperature is greater than 200 deg. C When the annealing temperature was higher than 450 deg. C, the Ag{sub 2}O phase would transform into a metallic Ag phase completely. Accordingly, the band gap of these films will change, along with the optical and electrical properties. In the study of Ag{sub 2}O-Cu{sub 2}O films, it is found that these two-phase composite films could exist obviously when deposited at room temperature. The photoinduced current of these composite films could be increased significantly, compared with that of a single Cu{sub 2}O phase. This is most likely due to that a large band gap semiconductor (Cu{sub 2}O) is coupled with a small band gap semiconductor (Ag{sub 2}O).
- OSTI ID:
- 22053736
- Journal Information:
- Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Vol. 28, Issue 4; Other Information: (c) 2010 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1553-1813
- Country of Publication:
- United States
- Language:
- English
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