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Title: Growth, electrical, and optical properties of nanocrystalline VO{sub 2} (011) thin films prepared by thermal oxidation of magnetron sputtered vanadium films

Abstract

Nanocrystalline vanadium dioxide (VO{sub 2}) thin films were prepared on glass substrates at different deposition temperatures by oxidizing sputtered vanadium films. Atomic force microscope, x-ray diffraction, and Raman scattering were employed to characterize the films. It was confirmed that low deposition temperature resulted in improving oxygen atom diffusion and VO{sub 2} nanograin growth in the thermal oxidation process. Investigation of the electrical properties revealed that the amplitude of semiconductor-metal transition and transition temperature decreased, whereas the Hall mobility and carrier concentration increased as the deposition temperature elevated. Optical investigations were carried out in the ultraviolet-visible-near-infrared region. Narrow optical band gaps were observed in these films.

Authors:
; ; ; ;  [1]
  1. School of Optoelectronic Information, State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China (UESTC), Chengdu 610054 (China)
Publication Date:
OSTI Identifier:
22053725
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films
Additional Journal Information:
Journal Volume: 28; Journal Issue: 4; Other Information: (c) 2010 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 1553-1813
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; DEPOSITION; ELECTRIC CONDUCTIVITY; GRAIN GROWTH; MAGNETRONS; NANOSTRUCTURES; NEAR INFRARED RADIATION; OPTICAL PROPERTIES; RAMAN EFFECT; RAMAN SPECTRA; SEMICONDUCTOR MATERIALS; THIN FILMS; TRANSITION TEMPERATURE; ULTRAVIOLET RADIATION; ULTRAVIOLET SPECTRA; VANADIUM OXIDES; VISIBLE SPECTRA; X-RAY DIFFRACTION

Citation Formats

Zhenfei, Luo, Zhiming, Wu, Xiangdong, Xu, Tao, Wang, and Yadong, Jiang. Growth, electrical, and optical properties of nanocrystalline VO{sub 2} (011) thin films prepared by thermal oxidation of magnetron sputtered vanadium films. United States: N. p., 2010. Web. doi:10.1116/1.3443562.
Zhenfei, Luo, Zhiming, Wu, Xiangdong, Xu, Tao, Wang, & Yadong, Jiang. Growth, electrical, and optical properties of nanocrystalline VO{sub 2} (011) thin films prepared by thermal oxidation of magnetron sputtered vanadium films. United States. https://doi.org/10.1116/1.3443562
Zhenfei, Luo, Zhiming, Wu, Xiangdong, Xu, Tao, Wang, and Yadong, Jiang. 2010. "Growth, electrical, and optical properties of nanocrystalline VO{sub 2} (011) thin films prepared by thermal oxidation of magnetron sputtered vanadium films". United States. https://doi.org/10.1116/1.3443562.
@article{osti_22053725,
title = {Growth, electrical, and optical properties of nanocrystalline VO{sub 2} (011) thin films prepared by thermal oxidation of magnetron sputtered vanadium films},
author = {Zhenfei, Luo and Zhiming, Wu and Xiangdong, Xu and Tao, Wang and Yadong, Jiang},
abstractNote = {Nanocrystalline vanadium dioxide (VO{sub 2}) thin films were prepared on glass substrates at different deposition temperatures by oxidizing sputtered vanadium films. Atomic force microscope, x-ray diffraction, and Raman scattering were employed to characterize the films. It was confirmed that low deposition temperature resulted in improving oxygen atom diffusion and VO{sub 2} nanograin growth in the thermal oxidation process. Investigation of the electrical properties revealed that the amplitude of semiconductor-metal transition and transition temperature decreased, whereas the Hall mobility and carrier concentration increased as the deposition temperature elevated. Optical investigations were carried out in the ultraviolet-visible-near-infrared region. Narrow optical band gaps were observed in these films.},
doi = {10.1116/1.3443562},
url = {https://www.osti.gov/biblio/22053725}, journal = {Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films},
issn = {1553-1813},
number = 4,
volume = 28,
place = {United States},
year = {Thu Jul 15 00:00:00 EDT 2010},
month = {Thu Jul 15 00:00:00 EDT 2010}
}