X-ray diffraction analysis of multilayer porous InP(001) structure
- Russian Academy of Sciences, Komi Research Center, Ural Division (Russian Federation)
- Russian Academy of Sciences, Shubnikov Institute of Crystallography (Russian Federation)
- Academy of Sciences of the Czech Republic, Institute of Photonics and Electronics (Czech Republic)
- German Electron Synchrotron DESY (Germany)
Multilayer structures composed of four porous bilayers have been studied by high-resolution X-ray diffraction using synchrotron radiation, and the photoluminescence of these structures has been investigated at 4 K. The porous structures were formed by anodic oxidation of InP(001) substrates in aqueous HCl solution. The structural parameters of the sublayers were varied by changing the electrochemical etching mode (potentiostatic/galvanostatic). The X-ray scattering intensity maps near the InP 004 reflection are obtained. A model for scattering from such systems is proposed based on the statistical dynamical diffraction theory. Theoretical scattering maps have been fitted to the experimental ones. It is shown that a mathematical analysis of the scattering intensity maps makes it possible to determine the structural parameters of sublayers. The reconstructed parameters (thickness, strain, and porosity of sublayers and the shape and arrangement of pores) are in satisfactory agreement with the scanning electron microscopy data.
- OSTI ID:
- 22051232
- Journal Information:
- Crystallography Reports, Vol. 55, Issue 2; Other Information: Copyright (c) 2010 Pleiades Publishing, Ltd.; Country of input: International Atomic Energy Agency (IAEA); ISSN 1063-7745
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ELECTROCHEMISTRY
ETCHING
HYDROCHLORIC ACID
INDIUM PHOSPHIDES
LAYERS
OXIDATION
PHOTOLUMINESCENCE
POROSITY
POROUS MATERIALS
REFLECTION
RESOLUTION
SCANNING ELECTRON MICROSCOPY
SHAPE
SOLUTIONS
STRAINS
SYNCHROTRON RADIATION
X-RAY DIFFRACTION