Influence of oxygen traces on an atmospheric-pressure radio-frequency capacitive argon plasma discharge
- Key Laboratory of Materials Modification by Laser, Ion, Electron Beams, Dalian University of Technology, Ministry of Education, Dalian 116024 (China) and School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024 (China)
- Kwangwoon Academy of Advanced Studies, Kwangwoon University, 447-1 Wolgye-dong, Nowon-gu, Seoul 137-701 (Korea, Republic of)
An atmospheric-pressure capacitive discharge source driven by radio-frequency power supply at 13.56 MHz has been developed experimentally that is capable of producing a homogeneous and cold glow discharge in O{sub 2}/Ar. With respect to the influence of oxygen component when diluted into argon plasma discharge on the discharge characteristics, the measurements of the electrical parameters (impedance, phase angle, resistance, and reactance) are made systematically and the densities of the metastable and resonant state of argon are determined by means of optical emission spectroscopy (OES). It is shown that the admixture of oxygen into argon plasma not only changes the electric characteristics but also alters the optical emission spectra greatly due to strong interaction between the oxygen content and the argon in the plasma environment.
- OSTI ID:
- 22046992
- Journal Information:
- Physics of Plasmas, Vol. 18, Issue 10; Other Information: (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 1070-664X
- Country of Publication:
- United States
- Language:
- English
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