Theoretical investigation of phase-controlled bias effect in capacitively coupled plasma discharges

Journal Article · Fri Jul 15 00:00:00 EDT 2011 · Physics of Plasmas

DOI:https://doi.org/10.1063/1.3615029· OSTI ID:22046909

Kwon, Deuk-Chul; Yoon, Jung-Sik ^[1]

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1. Convergence Plasma Research Center, National Fusion Research Institute, Daejeon 305-333 (Korea, Republic of)

We theoretically investigated the effect of phase difference between powered electrodes in capacitively coupled plasma (CCP) discharges. Previous experimental result has shown that the plasma potential could be controlled by using a phase-shift controller in CCP discharges. In this work, based on the previously developed radio frequency sheath models, we developed a circuit model to self-consistently determine the bias voltage from the plasma parameters. Results show that the present theoretical model explains the experimental results quite well and there is an optimum value of the phase difference for which the V{sub dc}/V{sub pp} ratio becomes a minimum.

• OSTI ID: 22046909
• Journal Information: Physics of Plasmas, Vol. 18, Issue 7; Other Information: (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 1070-664X
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
COUPLING
ELECTRODES
HIGH-FREQUENCY DISCHARGES
PHASE SHIFT
PLASMA
PLASMA POTENTIAL
PLASMA SHEATH
RADIOWAVE RADIATION