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Title: In situ observation of x-ray irradiation effect by using a multiwave x-ray diffraction phenomenon

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3661891· OSTI ID:22038772
 [1];  [2];  [3];  [4]
  1. Department of Advanced Materials Science, Graduate School of Frontier Sciences, the University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa, Chiba 277-8561 (Japan)
  2. Japan Synchrotron Radiation Research Institute (JASRI), 1-1-1 Kouto, Sayo-gun, Sayo-cho, Hyogo 679-5198 (Japan)
  3. Organic Nanomaterials Center, National Institute for Material Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044 (Japan)
  4. The Institute for Solid State Physics, the University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa, Chiba 277-8581 (Japan)

In situ observation of the complex scattering amplitude of x-ray specular reflection (amplitude reflectivity) was performed by using a method with a multiwave x-ray diffraction phenomenon. The method can be applied to the noncrystalline layers on a single crystal and allows us to determine its amplitude reflectivity with only a 0.01 degree of crystal rotation, that is, the area irradiated by the incident x rays is almost unchanged during the measurement. We used this method to observe an irradiation effect induced by monochromatic synchrotron x-rays that occurred on a Si(001) single crystal covered with a native oxide layer. The obtained time evolution of the amplitude reflectivities exhibited counterclockwise behavior in the complex plane, indicating that the thickness of the noncrystalline layer on the crystalline substrate was increased by the irradiation.

OSTI ID:
22038772
Journal Information:
Journal of Applied Physics, Vol. 110, Issue 10; Other Information: (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Country of Publication:
United States
Language:
English