Determining concentration depth profiles in fluorinated networks by means of electric force microscopy
- Institute of Materials Science and Technology (INTEMA), University of Mar del Plata and National Research Council (CONICET), JB. Justo 4302, Mar del Plata, Buenos Aires (Argentina)
- Centro de Fisica de Materiales CSIC-UPV/EHU, Materials Physics Center (MPC), Paseo Manuel de Lardizabal 5, 20018 San Sebastian (Spain)
By means of electric force microscopy, composition depth profiles were measured with nanometric resolution for a series of fluorinated networks. By mapping the dielectric permittivity along a line going from the surface to the bulk, we were able to experimentally access to the fluorine concentration profile. Obtained data show composition gradient lengths ranging from 30 nm to 80 nm in the near surface area for samples containing from 0.5 to 5 wt. % F, respectively. In contrast, no gradients of concentration were detected in bulk. This method has several advantages over other techniques because it allows profiling directly on a sectional cut of the sample. By combining the obtained results with x-ray photoelectron spectroscopy measurements, we were also able to quantify F/C ratio as a function of depth with nanoscale resolution.
- OSTI ID:
- 22038668
- Journal Information:
- Journal of Chemical Physics, Vol. 135, Issue 6; Other Information: (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-9606
- Country of Publication:
- United States
- Language:
- English
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