skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Ion induced spinodal dewetting of thin solid films

Abstract

We present experimental data and numerical simulations in order to show that the mechanism of spinodal dewetting is active during ion beam irradiation of thin solid films. The expected scaling law for the characteristic wavelengths versus the initial film thickness is modified by the presence of sputtering. The conclusion is fully supported by model simulation which shows a square law dependence for null sputtering yield and a bimodal trend when sputtering is included. This result is in contrast to earlier studies and opens the possibility to control and use ion induced dewetting for the fabrication of functional nanostructures.

Authors:
; ; ; ;  [1]
  1. Dipartimento di Fisica, Universita di Genova, Via Dodecaneso 33, 16146 Genova (Italy)
Publication Date:
OSTI Identifier:
22025576
Resource Type:
Journal Article
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 100; Journal Issue: 22; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0003-6951
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 77 NANOSCIENCE AND NANOTECHNOLOGY; CHROMIUM IONS; COMPUTERIZED SIMULATION; DEPOSITION; FABRICATION; ION BEAMS; IRRADIATION; NANOSTRUCTURES; NUMERICAL ANALYSIS; SCALING LAWS; SOLIDS; SPUTTERING; THIN FILMS

Citation Formats

Repetto, Luca, Setina Batic, Barbara, Firpo, Giuseppe, Piano, Emanuele, and Valbusa, Ugo. Ion induced spinodal dewetting of thin solid films. United States: N. p., 2012. Web. doi:10.1063/1.4724178.
Repetto, Luca, Setina Batic, Barbara, Firpo, Giuseppe, Piano, Emanuele, & Valbusa, Ugo. Ion induced spinodal dewetting of thin solid films. United States. https://doi.org/10.1063/1.4724178
Repetto, Luca, Setina Batic, Barbara, Firpo, Giuseppe, Piano, Emanuele, and Valbusa, Ugo. 2012. "Ion induced spinodal dewetting of thin solid films". United States. https://doi.org/10.1063/1.4724178.
@article{osti_22025576,
title = {Ion induced spinodal dewetting of thin solid films},
author = {Repetto, Luca and Setina Batic, Barbara and Firpo, Giuseppe and Piano, Emanuele and Valbusa, Ugo},
abstractNote = {We present experimental data and numerical simulations in order to show that the mechanism of spinodal dewetting is active during ion beam irradiation of thin solid films. The expected scaling law for the characteristic wavelengths versus the initial film thickness is modified by the presence of sputtering. The conclusion is fully supported by model simulation which shows a square law dependence for null sputtering yield and a bimodal trend when sputtering is included. This result is in contrast to earlier studies and opens the possibility to control and use ion induced dewetting for the fabrication of functional nanostructures.},
doi = {10.1063/1.4724178},
url = {https://www.osti.gov/biblio/22025576}, journal = {Applied Physics Letters},
issn = {0003-6951},
number = 22,
volume = 100,
place = {United States},
year = {Mon May 28 00:00:00 EDT 2012},
month = {Mon May 28 00:00:00 EDT 2012}
}