Radiation-induced surface degradation of GaAs and high electron mobility transistor structures
- Russian Academy of Sciences, Ioffe Physical-Technical Institute (Russian Federation)
- National Academy of Sciences of Ukraine, Lashkaryov Institute of Semiconductor Physics (Ukraine)
Transistor heterostructures with high-carrier-mobility have been studied. It is shown that, as the {gamma}-irradiation dose {Phi} increases, their degradation occurs in the following sequence. (i) At {Phi} < 10{sup 7} rad, the GaAs surface layer is damaged to a depth of 10 nm due to a >0.2-eV decrease in the diffusion energy of intrinsic defects and, probably, atmospheric oxygen. (ii) At {Phi} > 10{sup 7} rad, highly structurally disordered regions larger than 1 {mu}m are formed near microscopic defects or dislocations. (iii) At {Phi} > 10{sup 8} rad, there occurs degradation of the internal AlGaAs/InGaAs/GaAs interfaces and the working channel. An effective method for studying the degradation processes in heterostructures is to employ a set of structural diagnostic methods to analyze processes of radiation-induced and aging degradation, in combination with theoretical simulation of the occurring processes.
- OSTI ID:
- 22004654
- Journal Information:
- Semiconductors, Vol. 46, Issue 6; Other Information: Copyright (c) 2012 Pleiades Publishing, Ltd.; Country of input: International Atomic Energy Agency (IAEA); ISSN 1063-7826
- Country of Publication:
- United States
- Language:
- English
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