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Title: Laser produced plasma for efficient extreme ultraviolet light sources

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.4707871· OSTI ID:22004061

Extreme ultraviolet emission from laser produced plasma and their relevance to EUV source development is discussed. The current state of the field for Sn LPP sources operating at 13.5 nm is described and initial results are given for EUV emission from CO{sub 2} laser irradiation of a bulk Sn target. A maximum conversion efficiency of 1.7% has been measured and the influence of the CO{sub 2} laser temporal profile on the CE is discussed. A double pulse irradiation scheme is shown to increase CE up to a maximum value of 2.1% for an optimum prepulse - pulse delay of 150 ns. The emergence of a new EUVL source wavelength at 6.7 nm based on Gd and Tb LPPs has been outlined. An initial experiment investigating picosecond laser irradiation as a means to produce strong 6.7 nm emission from a Gd{sub 2}O{sub 3} target has been performed and verified.

OSTI ID:
22004061
Journal Information:
AIP Conference Proceedings, Vol. 1438, Issue 1; Conference: 17. international conference on atomic processes in plasmas (ICAPIP), Belfast, Northern Ireland (United Kingdom), 19-22 Jul 2011; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
Country of Publication:
United States
Language:
English