skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Gas Injection Apparatus for Vacuum Chamber

Abstract

We present in this article a gas injection apparatus which comprises the gas injector and its electronic command for vacuum chamber applications. Some of these applications are thin-film deposition by a pulsed laser deposition (PLD) or a cathodic arc deposition (arc-PVD) and the plasma generation. The electronic part has been developed to adjust the flow of the gas inside the vacuum chamber by controlling both of the injector's opening time and the repetition frequency to allow a better gas flow. In this case, the system works either on a pulsed mode or a continuous mode for some applications. In addition, the repetition frequency can be synchronised with a pulsed laser by an external signal coming from the laser, which is considered as an advantage for users. Good results have been obtained using the apparatus and testing with Argon and Nitrogen gases.

Authors:
; ;  [1]
  1. Centre de Developpement des Technologies Avancees CDTA, Division Milieux Ionises and Laser, BP 17, Cite du 20 Aout 1956, Baba Hassen, Alger (Algeria)
Publication Date:
OSTI Identifier:
21612454
Resource Type:
Journal Article
Journal Name:
AIP Conference Proceedings
Additional Journal Information:
Journal Volume: 1400; Journal Issue: 1; Conference: International congress on advances in applied physics and materials science, Antalya (Turkey), 12-15 May 2011; Other Information: DOI: 10.1063/1.3663115; (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0094-243X
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ARGON; CONTROL SYSTEMS; ENERGY BEAM DEPOSITION; GAS FLOW; GAS INJECTION; LASER RADIATION; NITROGEN; PHYSICAL VAPOR DEPOSITION; PLASMA; PULSED IRRADIATION; THIN FILMS; DEPOSITION; ELECTROMAGNETIC RADIATION; ELEMENTS; FILMS; FLUID FLOW; FLUID INJECTION; FLUIDS; GASES; IRRADIATION; NONMETALS; RADIATIONS; RARE GASES; SURFACE COATING

Citation Formats

Almabouada, F, Louhibi, D, and Hamici, M. Gas Injection Apparatus for Vacuum Chamber. United States: N. p., 2011. Web. doi:10.1063/1.3663115.
Almabouada, F, Louhibi, D, & Hamici, M. Gas Injection Apparatus for Vacuum Chamber. United States. https://doi.org/10.1063/1.3663115
Almabouada, F, Louhibi, D, and Hamici, M. 2011. "Gas Injection Apparatus for Vacuum Chamber". United States. https://doi.org/10.1063/1.3663115.
@article{osti_21612454,
title = {Gas Injection Apparatus for Vacuum Chamber},
author = {Almabouada, F and Louhibi, D and Hamici, M},
abstractNote = {We present in this article a gas injection apparatus which comprises the gas injector and its electronic command for vacuum chamber applications. Some of these applications are thin-film deposition by a pulsed laser deposition (PLD) or a cathodic arc deposition (arc-PVD) and the plasma generation. The electronic part has been developed to adjust the flow of the gas inside the vacuum chamber by controlling both of the injector's opening time and the repetition frequency to allow a better gas flow. In this case, the system works either on a pulsed mode or a continuous mode for some applications. In addition, the repetition frequency can be synchronised with a pulsed laser by an external signal coming from the laser, which is considered as an advantage for users. Good results have been obtained using the apparatus and testing with Argon and Nitrogen gases.},
doi = {10.1063/1.3663115},
url = {https://www.osti.gov/biblio/21612454}, journal = {AIP Conference Proceedings},
issn = {0094-243X},
number = 1,
volume = 1400,
place = {United States},
year = {Mon Dec 26 00:00:00 EST 2011},
month = {Mon Dec 26 00:00:00 EST 2011}
}