Gas Injection Apparatus for Vacuum Chamber

Journal Article · Mon Dec 26 00:00:00 EST 2011 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.3663115· OSTI ID:21612454

Almabouada, F; Louhibi, D; Hamici, M ^[1]

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1. Centre de Developpement des Technologies Avancees CDTA, Division Milieux Ionises and Laser, BP 17, Cite du 20 Aout 1956, Baba Hassen, Alger (Algeria)

We present in this article a gas injection apparatus which comprises the gas injector and its electronic command for vacuum chamber applications. Some of these applications are thin-film deposition by a pulsed laser deposition (PLD) or a cathodic arc deposition (arc-PVD) and the plasma generation. The electronic part has been developed to adjust the flow of the gas inside the vacuum chamber by controlling both of the injector's opening time and the repetition frequency to allow a better gas flow. In this case, the system works either on a pulsed mode or a continuous mode for some applications. In addition, the repetition frequency can be synchronised with a pulsed laser by an external signal coming from the laser, which is considered as an advantage for users. Good results have been obtained using the apparatus and testing with Argon and Nitrogen gases.

• OSTI ID: 21612454
• Journal Information: AIP Conference Proceedings, Vol. 1400, Issue 1; Conference: International congress on advances in applied physics and materials science, Antalya (Turkey), 12-15 May 2011; Other Information: DOI: 10.1063/1.3663115; (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ARGON
CONTROL SYSTEMS
ENERGY BEAM DEPOSITION
GAS FLOW
GAS INJECTION
LASER RADIATION
NITROGEN
PHYSICAL VAPOR DEPOSITION
PLASMA
PULSED IRRADIATION
THIN FILMS
DEPOSITION
ELECTROMAGNETIC RADIATION
ELEMENTS
FILMS
FLUID FLOW
FLUID INJECTION
FLUIDS
GASES
IRRADIATION
NONMETALS
RADIATIONS
RARE GASES
SURFACE COATING