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Title: In-situ Synchrotron Radiation X-ray Scattering Study On The Initial Structure Of Atomic Layer Deposition

Abstract

Due to the excellent conformality of ALD, it is not only adopted thin film, but also has been adopted for the fabrication of nanostructures. The surface reaction of ALD process is dependent on the substrate condition, thus the study on initial stage of ALD process is crucial to achieve controllable film growth. By the way, because of quite low scattering intensity of initial ultra thin layer, the high flux Synchrotron Radiation is needed. Synchrotron radiation x-ray scattering measurements allow us to investigate the atomic structure evolution of a few nanometer thickness films at the initial growth stage, nondestructively. Ru and TaN ALD films were grown. The thickness, roughness, and electron density were estimated by X-Ray Reflectivity (XRR) analysis. The island structures and its coverage also were estimated.

Authors:
 [1];  [2];  [3]
  1. Pohang Accelerator Laboratory, POSTECH, Pohang, Gyeongbuk (Korea, Republic of)
  2. Department of Physics, Soongsil univ., Seoul (Korea, Republic of)
  3. Department of MSE, POSTECH, Pohang, Gyeongbuk (Korea, Republic of)
Publication Date:
OSTI Identifier:
21612383
Resource Type:
Journal Article
Journal Name:
AIP Conference Proceedings
Additional Journal Information:
Journal Volume: 1399; Journal Issue: 1; Conference: 30. international conference on the physics of semiconductors, Seoul (Korea, Republic of), 25-30 Jul 2010; Other Information: DOI: 10.1063/1.3666330; (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0094-243X
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 36 MATERIALS SCIENCE; CRYSTAL STRUCTURE; DEPOSITION; ELECTRON DENSITY; FABRICATION; LAYERS; NANOSTRUCTURES; REFLECTIVITY; ROUGHNESS; SUBSTRATES; SURFACES; SYNCHROTRON RADIATION; TANTALUM NITRIDES; THIN FILMS; X RADIATION; X-RAY DIFFRACTION; BREMSSTRAHLUNG; COHERENT SCATTERING; DIFFRACTION; ELECTROMAGNETIC RADIATION; FILMS; IONIZING RADIATIONS; NITRIDES; NITROGEN COMPOUNDS; OPTICAL PROPERTIES; PHYSICAL PROPERTIES; PNICTIDES; RADIATIONS; REFRACTORY METAL COMPOUNDS; SCATTERING; SURFACE PROPERTIES; TANTALUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS

Citation Formats

Park, Y J, Department of MSE, POSTECH, Pohang, Gyeongbuk, Lee, D R, and Baik, S. In-situ Synchrotron Radiation X-ray Scattering Study On The Initial Structure Of Atomic Layer Deposition. United States: N. p., 2011. Web. doi:10.1063/1.3666330.
Park, Y J, Department of MSE, POSTECH, Pohang, Gyeongbuk, Lee, D R, & Baik, S. In-situ Synchrotron Radiation X-ray Scattering Study On The Initial Structure Of Atomic Layer Deposition. United States. https://doi.org/10.1063/1.3666330
Park, Y J, Department of MSE, POSTECH, Pohang, Gyeongbuk, Lee, D R, and Baik, S. 2011. "In-situ Synchrotron Radiation X-ray Scattering Study On The Initial Structure Of Atomic Layer Deposition". United States. https://doi.org/10.1063/1.3666330.
@article{osti_21612383,
title = {In-situ Synchrotron Radiation X-ray Scattering Study On The Initial Structure Of Atomic Layer Deposition},
author = {Park, Y J and Department of MSE, POSTECH, Pohang, Gyeongbuk and Lee, D R and Baik, S},
abstractNote = {Due to the excellent conformality of ALD, it is not only adopted thin film, but also has been adopted for the fabrication of nanostructures. The surface reaction of ALD process is dependent on the substrate condition, thus the study on initial stage of ALD process is crucial to achieve controllable film growth. By the way, because of quite low scattering intensity of initial ultra thin layer, the high flux Synchrotron Radiation is needed. Synchrotron radiation x-ray scattering measurements allow us to investigate the atomic structure evolution of a few nanometer thickness films at the initial growth stage, nondestructively. Ru and TaN ALD films were grown. The thickness, roughness, and electron density were estimated by X-Ray Reflectivity (XRR) analysis. The island structures and its coverage also were estimated.},
doi = {10.1063/1.3666330},
url = {https://www.osti.gov/biblio/21612383}, journal = {AIP Conference Proceedings},
issn = {0094-243X},
number = 1,
volume = 1399,
place = {United States},
year = {Fri Dec 23 00:00:00 EST 2011},
month = {Fri Dec 23 00:00:00 EST 2011}
}