Nanoindentation Studies Of Hard Nanocomposite Ti-B-N Thin Films

Rupa, P Karuna Purnapu; Chakraborty, P C; Mishra, Suman Kumari

doi:10.1063/1.3653698

Title: Nanoindentation Studies Of Hard Nanocomposite Ti-B-N Thin Films

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Abstract

Titanium boron nitride (Ti-B-N) films were deposited by reactive magnetron sputtering using single Titanium diboride (TiB{sub 2}) target in different Ar-N{sub 2} gas mixtures. The influence of N{sub 2}:Ar ratio on the microstructure and mechanical properties of the deposited films have been investigated. Atomic force microscopy analysis indicated the grain size decreases with incorporation of nitrogen in the films. Nanoindentation studies have shown the hardness decreases with nitrogen incorporation.

Authors:

Rupa, P Karuna Purnapu ^[1]; Chakraborty, P C ^[2]; Mishra, Suman Kumari ^[3]

Non Ferrous Materials Technology Development Center, Kanchanbagh, Hyderabad (India)
Department of Metallurgy and Materials Science, Jadavpur University, Kolkata (India)
National Metallurgical Laboratory, Jamshedpur India (India)

Publication Date:: Mon Dec 12 00:00:00 EST 2011

OSTI Identifier:: 21612351

Resource Type:: Journal Article

Journal Name:: AIP Conference Proceedings

Additional Journal Information:: Journal Volume: 1393; Journal Issue: 1; Conference: ICACNM-2011: International conference on advances in condensed and nano materials, Chandigarh (India), 23-26 Feb 2011; Other Information: DOI: 10.1063/1.3653698; (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0094-243X

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 77 NANOSCIENCE AND NANOTECHNOLOGY; ATOMIC FORCE MICROSCOPY; BORON NITRIDES; COMPOSITE MATERIALS; GRAIN SIZE; HARDNESS; MIXTURES; NANOSTRUCTURES; NITROGEN; PHASE DIAGRAMS; SPUTTERING; THIN FILMS; TITANIUM; TITANIUM BORIDES; X-RAY DIFFRACTION; BORIDES; BORON COMPOUNDS; COHERENT SCATTERING; DIAGRAMS; DIFFRACTION; DISPERSIONS; ELEMENTS; FILMS; INFORMATION; MATERIALS; MECHANICAL PROPERTIES; METALS; MICROSCOPY; MICROSTRUCTURE; NITRIDES; NITROGEN COMPOUNDS; NONMETALS; PNICTIDES; SCATTERING; SIZE; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS

Citation Formats


                    Rupa, P Karuna Purnapu, Chakraborty, P C, and Mishra, Suman Kumari. Nanoindentation Studies Of Hard Nanocomposite Ti-B-N Thin Films.  United States: N. p., 2011. 
        Web.  doi:10.1063/1.3653698.

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                    Rupa, P Karuna Purnapu, Chakraborty, P C, & Mishra, Suman Kumari. Nanoindentation Studies Of Hard Nanocomposite Ti-B-N Thin Films.  United States.  https://doi.org/10.1063/1.3653698

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                    Rupa, P Karuna Purnapu, Chakraborty, P C, and Mishra, Suman Kumari. 2011.  
        "Nanoindentation Studies Of Hard Nanocomposite Ti-B-N Thin Films".  United States.  https://doi.org/10.1063/1.3653698.

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@article{osti_21612351,

  title        = {Nanoindentation Studies Of Hard Nanocomposite Ti-B-N Thin Films},

  author       = {Rupa, P Karuna Purnapu and Chakraborty, P C and Mishra, Suman Kumari},

  abstractNote = {Titanium boron nitride (Ti-B-N) films were deposited by reactive magnetron sputtering using single Titanium diboride (TiB{sub 2}) target in different Ar-N{sub 2} gas mixtures. The influence of N{sub 2}:Ar ratio on the microstructure and mechanical properties of the deposited films have been investigated. Atomic force microscopy analysis indicated the grain size decreases with incorporation of nitrogen in the films. Nanoindentation studies have shown the hardness decreases with nitrogen incorporation.},

  doi          = {10.1063/1.3653698},

  url          = {https://www.osti.gov/biblio/21612351},
  journal      = {AIP Conference Proceedings},

  issn         = {0094-243X},

  number       = 1,

  volume       = 1393,

  place        = {United States},

  year         = {Mon Dec 12 00:00:00 EST 2011},

  month        = {Mon Dec 12 00:00:00 EST 2011}

}

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