Structural, Morphological and Optical properties of Sputtered Nickel oxide Thin Films
Abstract
Nickel oxide (NiO) thin films have been deposited by dc reactive magnetron sputtering technique on glass substrates at various substrate temperatures in the range of 303 to 723 K. The influence of substrate temperature on structural, morphological, compositional and optical properties was analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), energy dispersive spectroscopy (EDS) and spectrophotometer studies. The structural properties of the films were strongly influenced by the substrate temperature. From the microstructural studies, fine and uniform grains were grown with RMS roughness of 9.4 nm at substrate temperature of 523 K. The optical results indicated that the optical transmittance of the films increases with increasing substrate temperature up to 523 K, thereafter decreases. The optical band of the films increases with substrate temperature initially, thereafter decreased at higher temperatures. The Highest optical transmittance of 60 % and optical band gap of 3.82 eV was observed in the present study.
- Authors:
-
- Department of Physics, Sri Venkateswara University, Tirupati-517 502 (India)
- Publication Date:
- OSTI Identifier:
- 21612030
- Resource Type:
- Journal Article
- Journal Name:
- AIP Conference Proceedings
- Additional Journal Information:
- Journal Volume: 1391; Journal Issue: 1; Conference: OPTICS 2011: International conference on light - Optics: phenomena, materials, devices, and characterization, Calicut, Kerala (India), 23-25 May 2011; Other Information: DOI: 10.1063/1.3646785; (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 36 MATERIALS SCIENCE; ABSORPTION SPECTROSCOPY; ATOMIC FORCE MICROSCOPY; ENERGY GAP; GLASS; MICROSTRUCTURE; MORPHOLOGY; NICKEL OXIDES; OPACITY; ROUGHNESS; SCANNING ELECTRON MICROSCOPY; SPUTTERING; SUBSTRATES; TEMPERATURE DEPENDENCE; THIN FILMS; X-RAY DIFFRACTION; CHALCOGENIDES; COHERENT SCATTERING; DIFFRACTION; ELECTRON MICROSCOPY; FILMS; MICROSCOPY; NICKEL COMPOUNDS; OPTICAL PROPERTIES; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; SCATTERING; SPECTROSCOPY; SURFACE PROPERTIES; TRANSITION ELEMENT COMPOUNDS
Citation Formats
Reddy, A Mallikarjuna, Reddy, A Sivasankar, and Reddy, P Sreedhara. Structural, Morphological and Optical properties of Sputtered Nickel oxide Thin Films. United States: N. p., 2011.
Web. doi:10.1063/1.3646785.
Reddy, A Mallikarjuna, Reddy, A Sivasankar, & Reddy, P Sreedhara. Structural, Morphological and Optical properties of Sputtered Nickel oxide Thin Films. United States. https://doi.org/10.1063/1.3646785
Reddy, A Mallikarjuna, Reddy, A Sivasankar, and Reddy, P Sreedhara. 2011.
"Structural, Morphological and Optical properties of Sputtered Nickel oxide Thin Films". United States. https://doi.org/10.1063/1.3646785.
@article{osti_21612030,
title = {Structural, Morphological and Optical properties of Sputtered Nickel oxide Thin Films},
author = {Reddy, A Mallikarjuna and Reddy, A Sivasankar and Reddy, P Sreedhara},
abstractNote = {Nickel oxide (NiO) thin films have been deposited by dc reactive magnetron sputtering technique on glass substrates at various substrate temperatures in the range of 303 to 723 K. The influence of substrate temperature on structural, morphological, compositional and optical properties was analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), energy dispersive spectroscopy (EDS) and spectrophotometer studies. The structural properties of the films were strongly influenced by the substrate temperature. From the microstructural studies, fine and uniform grains were grown with RMS roughness of 9.4 nm at substrate temperature of 523 K. The optical results indicated that the optical transmittance of the films increases with increasing substrate temperature up to 523 K, thereafter decreases. The optical band of the films increases with substrate temperature initially, thereafter decreased at higher temperatures. The Highest optical transmittance of 60 % and optical band gap of 3.82 eV was observed in the present study.},
doi = {10.1063/1.3646785},
url = {https://www.osti.gov/biblio/21612030},
journal = {AIP Conference Proceedings},
issn = {0094-243X},
number = 1,
volume = 1391,
place = {United States},
year = {Thu Oct 20 00:00:00 EDT 2011},
month = {Thu Oct 20 00:00:00 EDT 2011}
}