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Title: Extraction of low-energy negative oxygen ions for thin film formation

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.3637442· OSTI ID:21611718
; ; ;  [1];  [2]
  1. Graduate School of Engineering, Doshisha University, Kyotanabe, Kyoto 610-0321 (Japan)
  2. Novelion Systems Co. Ltd., Kyotanabe, Kyoto 610-0332 (Japan)

Coextraction of low-energy positive and negative ions were performed using a plasma sputter-type ion source system driven by a 13.56 MHz radio frequency (rf) power. Titanium (Ti) atoms were sputtered out from a target and the sputtered neutrals were postionized in oxygen/argon (O{sub 2}/Ar) plasma prior to extraction. The negative O ions were surface-produced and self-extracted. Mass spectral analyses of the extracted ion beams revealed the dependence of the ion current on the incident rf power, induced target bias and O{sub 2}/Ar partial pressure ratio. Ti{sup +} current was found to be dependent on Ar{sup +} current and reached a saturation value with increasing O{sub 2} partial pressure while the O{sup -} current showed a peak current at around 1:9 O{sub 2}/Ar partial pressure ratio. Ti{sup +} current was several orders of magnitude higher than that of the O{sup -} current.

OSTI ID:
21611718
Journal Information:
AIP Conference Proceedings, Vol. 1390, Issue 1; Conference: 2. international symposium on negative ions, beams and sources, Takayama City (Japan), 16-19 Nov 2010; Other Information: DOI: 10.1063/1.3637442; (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
Country of Publication:
United States
Language:
English