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Title: Nanofabrication of Optical Elements for SXR and EUV Applications: Ion Beam Lithography as a New Approach

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.3625315· OSTI ID:21608266
 [1]; ;  [2];  [1]
  1. Institute for X-Optics, RheinAhrCampus Remagen, University of Applied Sciences Koblenz, Suedallee 2, 53424 Remagen (Germany)
  2. Research Group Electron Microscopy and Analytics, caesar Research Center, Ludwig-Erhard-Allee 2, 53175 Bonn (Germany)

Diffractive optical elements are important components for applications in soft x-ray and extreme ultraviolet radiation. At present, the standard fabrication method for such optics is based on electron beam lithography followed by nanostructuring. This requires a series of complex processes including exposure, reactive ion-etching, and electro-plating. We report on experiments showing the single-step fabrication of such elements using ion beam lithography. Both transmission and reflection gratings were fabricated and successfully implemented as spectrometers at laboratory soft x-ray sources. Additionally, first steps toward zone plate fabrication are described.

OSTI ID:
21608266
Journal Information:
AIP Conference Proceedings, Vol. 1365, Issue 1; Conference: 10. international conference on X-ray microscopy, Chicago, IL (United States), 15-20 Aug 2010; Other Information: DOI: 10.1063/1.3625315; (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
Country of Publication:
United States
Language:
English