Nanofabrication of Optical Elements for SXR and EUV Applications: Ion Beam Lithography as a New Approach
Journal Article
·
· AIP Conference Proceedings
- Institute for X-Optics, RheinAhrCampus Remagen, University of Applied Sciences Koblenz, Suedallee 2, 53424 Remagen (Germany)
- Research Group Electron Microscopy and Analytics, caesar Research Center, Ludwig-Erhard-Allee 2, 53175 Bonn (Germany)
Diffractive optical elements are important components for applications in soft x-ray and extreme ultraviolet radiation. At present, the standard fabrication method for such optics is based on electron beam lithography followed by nanostructuring. This requires a series of complex processes including exposure, reactive ion-etching, and electro-plating. We report on experiments showing the single-step fabrication of such elements using ion beam lithography. Both transmission and reflection gratings were fabricated and successfully implemented as spectrometers at laboratory soft x-ray sources. Additionally, first steps toward zone plate fabrication are described.
- OSTI ID:
- 21608266
- Journal Information:
- AIP Conference Proceedings, Vol. 1365, Issue 1; Conference: 10. international conference on X-ray microscopy, Chicago, IL (United States), 15-20 Aug 2010; Other Information: DOI: 10.1063/1.3625315; (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
Similar Records
Nanofabrication of subwavelength, binary, high-efficiency diffractive optical elements in GaAs
X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography; Proceedings of the Meeting, San Diego, CA, July 9-13, 1990
Multilayers are enabling new science with x-ray free electron lasers
Journal Article
·
Wed Nov 01 00:00:00 EST 1995
· Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena
·
OSTI ID:21608266
+1 more
X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography; Proceedings of the Meeting, San Diego, CA, July 9-13, 1990
Conference
·
Tue Jan 01 00:00:00 EST 1991
·
OSTI ID:21608266
Multilayers are enabling new science with x-ray free electron lasers
Journal Article
·
Tue Jul 17 00:00:00 EDT 2007
· SPIE Newsroom, N/A, N/A, September 10, 2007, N/A
·
OSTI ID:21608266
Related Subjects
77 NANOSCIENCE AND NANOTECHNOLOGY
DIFFRACTION GRATINGS
ELECTRON BEAMS
ELECTROPLATING
ETCHING
EXTREME ULTRAVIOLET RADIATION
FABRICATION
ION BEAMS
NANOSTRUCTURES
PLATES
SOFT X RADIATION
X-RAY DIFFRACTION
X-RAY SPECTROMETERS
BEAMS
COHERENT SCATTERING
DEPOSITION
DIFFRACTION
ELECTRODEPOSITION
ELECTROLYSIS
ELECTROMAGNETIC RADIATION
IONIZING RADIATIONS
LEPTON BEAMS
LYSIS
MEASURING INSTRUMENTS
PARTICLE BEAMS
PLATING
RADIATIONS
SCATTERING
SPECTROMETERS
SURFACE COATING
SURFACE FINISHING
ULTRAVIOLET RADIATION
X RADIATION
DIFFRACTION GRATINGS
ELECTRON BEAMS
ELECTROPLATING
ETCHING
EXTREME ULTRAVIOLET RADIATION
FABRICATION
ION BEAMS
NANOSTRUCTURES
PLATES
SOFT X RADIATION
X-RAY DIFFRACTION
X-RAY SPECTROMETERS
BEAMS
COHERENT SCATTERING
DEPOSITION
DIFFRACTION
ELECTRODEPOSITION
ELECTROLYSIS
ELECTROMAGNETIC RADIATION
IONIZING RADIATIONS
LEPTON BEAMS
LYSIS
MEASURING INSTRUMENTS
PARTICLE BEAMS
PLATING
RADIATIONS
SCATTERING
SPECTROMETERS
SURFACE COATING
SURFACE FINISHING
ULTRAVIOLET RADIATION
X RADIATION