High-sensitive interferometric control of the quality of diffractive elements

Journal Article · Mon Jan 24 00:00:00 EST 2011 · Quantum Electronics (Woodbury, N.Y.)

DOI:https://doi.org/10.1070/QE2010V040N12ABEH013990· OSTI ID:21541822

Lyalikov, A M ^[1]

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1. Yanka Kupala State University of Grodno, Grodno (Belarus)

The prospects of the long lateral shear interferometry for controlling the quality of diffractive elements are shown. In this case, use is made of two diffractive elements, one of which is under investigation, and the other is the model one. A universal device is proposed to control the quality of the diffractive elements of both transmission and reflection types. We present the results of experimental realisation of the technique for the quality control of production of two-dimensional amplitude masks and reflection diffraction gratings. (interferometry)

• OSTI ID: 21541822
• Journal Information: Quantum Electronics (Woodbury, N.Y.), Vol. 40, Issue 12; Other Information: DOI: 10.1070/QE2010v040n12ABEH013990; ISSN 1063-7818
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
72 PHYSICS OF ELEMENTARY PARTICLES AND FIELDS
AMPLITUDES
DIFFRACTION GRATINGS
INTERFEROMETRY
QUALITY CONTROL
REFLECTION
TWO-DIMENSIONAL CALCULATIONS
CONTROL