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Title: Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. II. Positive ions

Abstract

Spectra of the ion mass and energy distributions of positive ions in reactive (Ar/O{sub 2}) and nonreactive (Ar) dc magnetron sputtering discharges have been investigated by energy-resolved mass spectrometry. The results of three sputter target materials, i.e., Cu, In, and W are compared to each other. Besides the main gas constituents, mass spectra reveal a variety of molecular ions which are dependent on the target material. In reactive mode, ArO{sup +} is always observed in Ar/O{sub 2} but molecules containing Ar and the metal were exclusively found for the Cu target. The occurrence of the different ions is explained in the context of their bond strengths obtained from density functional theory calculations. The energy spectra generally contain the known low-energy peak corresponding to the plasma potential. Differently extended high-energy tails due to sputtered material were observed for the different targets. Besides these, high-energetic ions were detected with up to several 100 eV. Their energies are significantly different for Ar{sup +} and O{sup +} with Ar{sup +} strongly depending on the target material. The spectra are discussed together with results from transport of ions in matter (TRIM) calculation to elucidate the origin of these energetic ions.

Authors:
;  [1];  [2]
  1. Helmholtz-Zentrum Berlin fuer Materialien und Energie, Institut Solare Brennstoffe, Hahn-Meitner-Platz 1, D-14109 Berlin (Germany)
  2. Leibniz-Institut fuer Oberflaechenmodifizierung e.V., Permoserstrasse 15, D-04318 Leipzig (Germany)
Publication Date:
OSTI Identifier:
21538211
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 109; Journal Issue: 7; Other Information: DOI: 10.1063/1.3553847; (c) 2011 American Institute of Physics; Journal ID: ISSN 0021-8979
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ARGON IONS; BEAM-PLASMA SYSTEMS; CATIONS; DENSITY FUNCTIONAL METHOD; DISTRIBUTION; ELECTRONEGATIVITY; ENERGY SPECTRA; HIGH-FREQUENCY DISCHARGES; MAGNETRONS; MASS; MASS SPECTRA; MASS SPECTROSCOPY; METALS; MOLECULAR IONS; MOLECULES; OXYGEN IONS; PLASMA; PLASMA POTENTIAL; SPUTTERING; TAIL IONS; CALCULATION METHODS; CHARGED PARTICLES; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; IONS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; SPECTRA; SPECTROSCOPY; VARIATIONAL METHODS

Citation Formats

Welzel, Th, Ellmer, K, and Naumov, S. Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. II. Positive ions. United States: N. p., 2011. Web. doi:10.1063/1.3553847.
Welzel, Th, Ellmer, K, & Naumov, S. Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. II. Positive ions. United States. https://doi.org/10.1063/1.3553847
Welzel, Th, Ellmer, K, and Naumov, S. 2011. "Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. II. Positive ions". United States. https://doi.org/10.1063/1.3553847.
@article{osti_21538211,
title = {Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. II. Positive ions},
author = {Welzel, Th and Ellmer, K and Naumov, S},
abstractNote = {Spectra of the ion mass and energy distributions of positive ions in reactive (Ar/O{sub 2}) and nonreactive (Ar) dc magnetron sputtering discharges have been investigated by energy-resolved mass spectrometry. The results of three sputter target materials, i.e., Cu, In, and W are compared to each other. Besides the main gas constituents, mass spectra reveal a variety of molecular ions which are dependent on the target material. In reactive mode, ArO{sup +} is always observed in Ar/O{sub 2} but molecules containing Ar and the metal were exclusively found for the Cu target. The occurrence of the different ions is explained in the context of their bond strengths obtained from density functional theory calculations. The energy spectra generally contain the known low-energy peak corresponding to the plasma potential. Differently extended high-energy tails due to sputtered material were observed for the different targets. Besides these, high-energetic ions were detected with up to several 100 eV. Their energies are significantly different for Ar{sup +} and O{sup +} with Ar{sup +} strongly depending on the target material. The spectra are discussed together with results from transport of ions in matter (TRIM) calculation to elucidate the origin of these energetic ions.},
doi = {10.1063/1.3553847},
url = {https://www.osti.gov/biblio/21538211}, journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 7,
volume = 109,
place = {United States},
year = {Fri Apr 01 00:00:00 EDT 2011},
month = {Fri Apr 01 00:00:00 EDT 2011}
}