Surface damage on diamond membranes fabricated by ion implantation and lift-off
- School of Physics, University of Melbourne, 3010 Victoria (Australia)
- Electron Microscopy Unit, Bio21 Institute, University of Melbourne, 3010 Victoria (Australia)
- Department of Physics, Solid State Institute, Technion, 32000 Haifa (Israel)
- Vanderbilt Institute of Nanoscale Science and Engineering, Vanderbilt University, Tennessee 37240 (United States)
Thin membranes with excellent optical properties are essential elements in diamond based photonic systems. Due to the chemical inertness of diamond, ion beam processing must be employed to carve photonic structures. One method to realize such membranes is ion-implantation graphitization followed by chemical removal of the sacrificial graphite. The interface revealed when the sacrificial layer is removed has interesting properties. To investigate this interface, we employed the surface sensitive technique of grazing angle channeled Rutherford backscattering spectroscopy. Even after high temperature annealing and chemical etching a thin layer of damaged diamond remains, however, it is removed by hydrogen plasma exposure.
- OSTI ID:
- 21518471
- Journal Information:
- Applied Physics Letters, Vol. 98, Issue 23; Other Information: DOI: 10.1063/1.3597223; (c) 2011 American Institute of Physics; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
ANNEALING
DIAMONDS
ETCHING
GRAPHITE
GRAPHITIZATION
INTERFACES
ION BEAMS
ION IMPLANTATION
LAYERS
MEMBRANES
OPTICAL PROPERTIES
PHYSICAL RADIATION EFFECTS
PROCESSING
REMOVAL
RUTHERFORD BACKSCATTERING SPECTROSCOPY
SEMICONDUCTOR MATERIALS
SURFACES
THIN FILMS
BEAMS
CARBON
ELEMENTS
FILMS
HEAT TREATMENTS
MATERIALS
MINERALS
NONMETALS
PHYSICAL PROPERTIES
RADIATION EFFECTS
SPECTROSCOPY
SURFACE FINISHING