skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Thermal conductivity as a metric for the crystalline quality of SrTiO{sub 3} epitaxial layers

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3579993· OSTI ID:21518466
 [1];  [2]; ; ;  [3];  [4]; ;  [5]; ;  [6];  [7];  [8];  [9]
  1. Energy Plant Research Division, Korea Institute of Machinery and Materials, Daejon 305-343 (Korea, Republic of)
  2. Applied Science and Technology Graduate Group, University of California, Berkeley, California 94720 (United States)
  3. Department of Materials Science and Engineering, and Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801 (United States)
  4. Department of Physics, University of California, Berkeley, California 94720 (United States)
  5. Department of Materials, University of California, Santa Barbara, California 93106 (United States)
  6. Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853 (United States)
  7. Faculty of Science and Technology, University of Twente, Faculty of Science and Technology, 7500 AE Enschede (Netherlands)
  8. Department of Energy, ARPA-E, Washington DC 20585 (United States)
  9. Department of Materials Science and Engineering, University of California, Berkeley, California 94720 (United States)

Measurements of thermal conductivity {Lambda} by time-domain thermoreflectance in the temperature range 100<T<300 K are used to characterize the crystalline quality of epitaxial layers of a prototypical oxide, SrTiO{sub 3}. Twenty samples from five institutions using two growth techniques, molecular beam epitaxy and pulsed laser deposition (PLD), were analyzed. Optimized growth conditions produce layers with {Lambda} comparable to bulk single crystals. Many PLD layers, particularly those that use ceramics as the target material, show surprisingly low {Lambda}. For homoepitaxial layers, the decrease in {Lambda} created by point defects correlates well with the expansion of the lattice parameter in the direction normal to the surface.

OSTI ID:
21518466
Journal Information:
Applied Physics Letters, Vol. 98, Issue 22; Other Information: DOI: 10.1063/1.3579993; (c) 2011 American Institute of Physics; ISSN 0003-6951
Country of Publication:
United States
Language:
English

Similar Records

Thermal conductivity as a metric for the crystalline quality of SrTiO3 epitaxial layers
Journal Article · Sat Jan 01 00:00:00 EST 2011 · APPLIED PHYSICS LETTERS · OSTI ID:21518466

Influence of oxygen background pressure on crystalline quality of SrTiO{sub 3} films grown on MgO by pulsed laser deposition
Journal Article · Mon Sep 01 00:00:00 EDT 1997 · Applied Physics Letters · OSTI ID:21518466

Improved crystalline properties of laser molecular beam epitaxy grown SrTiO{sub 3} by rutile TiO{sub 2} layer on hexagonal GaN
Journal Article · Sun Nov 15 00:00:00 EST 2009 · Journal of Applied Physics · OSTI ID:21518466