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Title: High-performance metamorphic InGaAs resonant cavity enhanced photodetector grown on GaAs substrate

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3592569· OSTI ID:21518437
; ; ; ; ; ;  [1]; ; ; ; ;  [2]
  1. State Key laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083 (China)
  2. State Key laboratory for Superlattices and microstructures, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083 (China)

In this letter, we demonstrated a top illuminated 1.55 {mu}m metamorphic InGaAs resonant-cavity-enhanced p-i-n photodetector grown on GaAs substrate. The photodetectors were grown by a solid-source molecular beam epitaxy system. The high quality linearly graded In{sub x}Al{sub 0.4}Ga{sub 1-x-0.4}As metamorphic buffer layer enabled photodiodes to achieve ultralow dark current densities of 2.3x10{sup -6} A/cm{sup 2} at 0 V and 4.2x10{sup -5} A/cm{sup 2} at a reverse bias of 5 V. A high quantum efficiency of 84.4% at resonant wavelength of 1542 nm, a full width at half maximum about 14 nm, and a -3 dB bandwidth up to 13 GHz were also obtained.

OSTI ID:
21518437
Journal Information:
Applied Physics Letters, Vol. 98, Issue 20; Other Information: DOI: 10.1063/1.3592569; (c) 2011 American Institute of Physics; ISSN 0003-6951
Country of Publication:
United States
Language:
English