Mass spectrometric study on inactivation mechanism of spore-forming bacteria by low-pressure surface-wave excited oxygen plasma

Journal Article · Mon May 09 00:00:00 EDT 2011 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.3588036· OSTI ID:21518426

Ying, Zhao; Ogino, Akihisa; Nagatsu, Masaaki ^[1]

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1. Graduate School of Science and Technology, Shizuoka University, 3-5-1, Johoku, Naka-ku, Hamamatsu 432-8561 (Japan)

In this letter, the etching phenomena of the spore-forming bacteria by oxygen plasma were investigated by using quadrupole mass spectrometry. The etching by-products of H{sub 2}O and CO{sub 2} were obviously detected during the oxygen plasma irradiation by the multiple ion detection measurement. Inactivation of roughly 10{sup 6} spores population was achieved under almost the same reduced spore shapes for three different incident microwave powers. It is considered from the present results that the oxygen radical etching could cause damage to the germinant receptors located in the inner membrane inevitable for germination of spores, without any damage of the DNA in the cores.

• OSTI ID: 21518426
• Journal Information: Applied Physics Letters, Vol. 98, Issue 19; Other Information: DOI: 10.1063/1.3588036; (c) 2011 American Institute of Physics; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

60 APPLIED LIFE SCIENCES
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
BACTERIA
CARBON DIOXIDE
CHEMICAL ANALYSIS
ETCHING
GERMINATION
INACTIVATION
ION DETECTION
IONIZING RADIATIONS
IRRADIATION
MASS SPECTROSCOPY
MEMBRANES
MICROWAVE RADIATION
OXYGEN
RECEPTORS
SPORES
WAVE PROPAGATION
CARBON COMPOUNDS
CARBON OXIDES
CHALCOGENIDES
CHARGED PARTICLE DETECTION
DETECTION
ELECTROMAGNETIC RADIATION
ELEMENTS
MEMBRANE PROTEINS
MICROORGANISMS
NONMETALS
ORGANIC COMPOUNDS
OXIDES
OXYGEN COMPOUNDS
PROTEINS
RADIATION DETECTION
RADIATIONS
SPECTROSCOPY
SURFACE FINISHING