Synthesis of few-layered graphene by H{sub 2}O{sub 2} plasma etching of graphite

Journal Article · Mon May 02 00:00:00 EDT 2011 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.3589354· OSTI ID:21518423

Guixia, Zhao; Dadong, Shao; Changlun, Chen; Xiangke, Wang ^[1]

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1. Key Lab of Novel Thin Film Solar Cells, Institute of Plasma Physics, Chinese Academy of Sciences, P.O. Box 1126, Hefei 230031 (China)

Herein, we reported an approach to synthesize few-layered graphene by etching of the graphite using H{sub 2}O{sub 2} plasma technique. The synthesized few-layered graphene was characterized by scanning electron microscopy, atomic force microscopy, Raman spectroscopy, and x-ray photoelectron spectroscopy (XPS). The analysis showed that few-layered graphene was formed in high quality level. The XPS analysis suggested that H{sub 2}O{sub 2} plasma etching of graphite could oxidize graphene and generated -C-OH and >C=O groups on the graphene surfaces. The H{sub 2}O{sub 2} plasma technique is an easy and environmental friendly method to synthesize few-layered graphene from the graphite.

• OSTI ID: 21518423
• Journal Information: Applied Physics Letters, Vol. 98, Issue 18; Other Information: DOI: 10.1063/1.3589354; (c) 2011 American Institute of Physics; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
77 NANOSCIENCE AND NANOTECHNOLOGY
ATOMIC FORCE MICROSCOPY
CARBON
ETCHING
GRAPHITE
HONEYCOMB STRUCTURES
HYDROGEN PEROXIDE
LAYERS
O GROUPS
RAMAN SPECTRA
RAMAN SPECTROSCOPY
SCANNING ELECTRON MICROSCOPY
SPUTTERING
SURFACES
X-RAY PHOTOELECTRON SPECTROSCOPY
DYNAMICAL GROUPS
ELECTRON MICROSCOPY
ELECTRON SPECTROSCOPY
ELEMENTS
HYDROGEN COMPOUNDS
LASER SPECTROSCOPY
LIE GROUPS
MECHANICAL STRUCTURES
MICROSCOPY
MINERALS
NONMETALS
OXYGEN COMPOUNDS
PEROXIDES
PHOTOELECTRON SPECTROSCOPY
SPECTRA
SPECTROSCOPY
SURFACE FINISHING
SYMMETRY GROUPS