Absence of vapor-liquid-solid growth during molecular beam epitaxy of self-induced InAs nanowires on Si
- Walter Schottky Institut and Physik Department, Technische Universitaet Muenchen, Garching 85748 (Germany)
- Department of Chemistry, Ludwig-Maximilians-Universitaet Muenchen, Munich 81377 (Germany)
The growth mechanism of self-induced InAs nanowires (NWs) grown on Si (111) by molecular beam epitaxy was investigated by in situ reflection high energy electron diffraction and ex situ scanning and transmission electron microscopy. Abrupt morphology transition and in-plane strain relaxation revealed that InAs NWs nucleate without any significant delay and under the absence of indium (In) droplets. These findings are independent of the As/In-flux ratio, revealing entirely linear vertical growth rate and nontapered NWs. No evidence of In droplets nor associated change in the NW apex morphology was observed for various growth termination procedures. These results highlight the absence of vapor-liquid-solid growth, providing substantial benefits for realization of atomically abrupt doping and composition profiles in future axial InAs-based NW heterostructures on Si.
- OSTI ID:
- 21518347
- Journal Information:
- Applied Physics Letters, Vol. 98, Issue 12; Other Information: DOI: 10.1063/1.3567496; (c) 2011 American Institute of Physics; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
77 NANOSCIENCE AND NANOTECHNOLOGY
CRYSTAL GROWTH
DROPLETS
ELECTRON DIFFRACTION
INDIUM ARSENIDES
MOLECULAR BEAM EPITAXY
NANOSTRUCTURES
QUANTUM WIRES
REFLECTION
RELAXATION
SCANNING ELECTRON MICROSCOPY
SEMICONDUCTOR MATERIALS
SILICON
SOLIDS
STRAINS
TRANSMISSION ELECTRON MICROSCOPY
ARSENIC COMPOUNDS
ARSENIDES
COHERENT SCATTERING
CRYSTAL GROWTH METHODS
DIFFRACTION
ELECTRON MICROSCOPY
ELEMENTS
EPITAXY
INDIUM COMPOUNDS
MATERIALS
MICROSCOPY
PARTICLES
PNICTIDES
SCATTERING
SEMIMETALS