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Title: Fast growth of graphene patterns by laser direct writing

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3569720· OSTI ID:21518345
; ; ; ; ; ; ;  [1];  [2];  [3]
  1. Department of Electrical Engineering, University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0511 (United States)
  2. Department of Physics, Sungkyunkwan University, Suwon, 440-746 (Korea, Republic of)
  3. Department of Mechanical and Automation Engineering, Beijing Institute of Technology, Beijing 100081 (China)

Rapid single-step fabrication of graphene patterns was developed using laser-induced chemical vapor deposition (LCVD). A laser beam irradiates a thin nickel foil in a CH{sub 4} and H{sub 2} environment to induce a local temperature rise, thereby allowing the direct writing of graphene patterns in precisely controlled positions at room temperature. Line patterns can be achieved with a single scan without pre- or postprocesses. Surprisingly, the growth rate is several thousand times faster than that of general CVD methods. The discovery and development of the LCVD growth process provide a route for the rapid fabrication of graphene patterns for various applications.

OSTI ID:
21518345
Journal Information:
Applied Physics Letters, Vol. 98, Issue 12; Other Information: DOI: 10.1063/1.3569720; (c) 2011 American Institute of Physics; ISSN 0003-6951
Country of Publication:
United States
Language:
English