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Title: Suppression of donor-vacancy clusters in germanium by concurrent annealing and irradiation

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3534791· OSTI ID:21518238
;  [1]
  1. Institut fuer Materialphysik, Westfaelische Wilhelms-Universitaet Muenster, 48149 Muenster (Germany)

Diffusion of phosphorous and arsenic in germanium under in situ proton irradiation has been performed and analyzed with secondary ion mass spectrometry. Dopant profiles corresponding to proton-exposed regions exhibit a higher penetration depth and more pronounced box shape than profiles of nonexposed regions. Continuum theoretical simulations reveal that diffusion under irradiation is much less affected by inactive donor-vacancy clusters than diffusion under annealing only. The suppression of donor-vacancy clusters is caused by interstitials in supersaturation and vacancy concentrations close to thermal equilibrium. Concurrent annealing and irradiation have the potential to attain high active doping levels in Ge.

OSTI ID:
21518238
Journal Information:
Applied Physics Letters, Vol. 98, Issue 1; Other Information: DOI: 10.1063/1.3534791; (c) 2011 American Institute of Physics; ISSN 0003-6951
Country of Publication:
United States
Language:
English