A new optically transparent silicon containing polyimide film
Conference
·
OSTI ID:215154
- Univ. of Delhi (India)
A new optically transparent, heat-resistant, flexible silicon containing polyimide (PI)(SIDA-BAPB) film has been developed. It was characterized by UV-Visible, FT-IR, differential scanning calorimetery (DSC), thermomechanical analysis (TMA) and thermogravimetric (TGA) analysis. The developed film showed high optical transparency in the 350-600 nm range of electromagnetic spectrum. The DSC analysis of the film showed glass transition temperature (T{sub g}) at 200{degrees}C. The dynamic thermogravimetric analysis (TGA) demonstrated its polymer decomposition temperature at 425{degrees}C. The char yield of the amorphous film in nitrogen at 800{degrees}C was 61%.
- OSTI ID:
- 215154
- Report Number(s):
- CONF-950801-; TRN: 96:000922-0675
- Resource Relation:
- Conference: 210. national meeting of the American Chemical Society (ACS), Chicago, IL (United States), 20-25 Aug 1995; Other Information: PBD: 1995; Related Information: Is Part Of 210th ACS national meeting. Part 1 and 2; PB: 1866 p.
- Country of Publication:
- United States
- Language:
- English
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