Evolution of Ion Implantation Technology and its Contribution to Semiconductor Industry

Journal Article · Fri Jan 07 00:00:00 EST 2011 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.3548476· OSTI ID:21510134

Tsukamoto, Katsuhiro ^[1]; Kuroi, Takashi; Kawasaki, Yoji ^[2]

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1. Mitsubishi Electric Corporation (Japan)
2. Renesas Electronics Corporation (Japan)

Industrial aspects of the evolution of ion implantation technology will be reviewed, and their impact on the semiconductor industry will be discussed. The main topics will be the technology's application to the most advanced, ultra scaled CMOS, and to power devices, as well as productivity improvements in implantation technology. Technological insights into future developments in ion-related technologies for emerging industries will also be presented.

• OSTI ID: 21510134
• Journal Information: AIP Conference Proceedings, Vol. 1321, Issue 1; Conference: IIT 2010: 18. international conference on ion implantation technology, Kyoto (Japan), 6-11 Jun 2010; Other Information: DOI: 10.1063/1.3548476; (c) 2010 American Institute of Physics; ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ANNEALING
CHANNELING
EVOLUTION
INDUSTRY
ION IMPLANTATION
MOS TRANSISTORS
PRODUCTIVITY
SEMICONDUCTOR MATERIALS
HEAT TREATMENTS
MATERIALS
SEMICONDUCTOR DEVICES
TRANSISTORS