Local deposition of high-purity Pt nanostructures by combining electron beam induced deposition and atomic layer deposition

Journal Article · Tue Jun 15 00:00:00 EDT 2010 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.3431351· OSTI ID:21476303

Mackus, A J. M.; Kessels, W M. M. ^[1]; Mulders, J J. L. ^[2]

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1. Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven (Netherlands)
2. FEI Electron Optics, Achtseweg Noord 5, 5651 GG Eindhoven (Netherlands)

An approach for direct-write fabrication of high-purity platinum nanostructures has been developed by combining nanoscale lateral patterning by electron beam induced deposition (EBID) with area-selective deposition of high quality material by atomic layer deposition (ALD). Because virtually pure, polycrystalline Pt nanostructures are obtained, the method extends the application possibilities of EBID, whereas compared to other area-selective ALD approaches, a much higher resolution is attainable; potentially down to sub-10 nm lateral dimensions.

• OSTI ID: 21476303
• Journal Information: Journal of Applied Physics, Vol. 107, Issue 11; Other Information: DOI: 10.1063/1.3431351; (c) 2010 American Institute of Physics; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

77 NANOSCIENCE AND NANOTECHNOLOGY
36 MATERIALS SCIENCE
ELECTRON BEAMS
ENERGY BEAM DEPOSITION
FABRICATION
LAYERS
NANOSTRUCTURES
PLATINUM
POLYCRYSTALS
RESOLUTION
BEAMS
CRYSTALS
DEPOSITION
ELEMENTS
LEPTON BEAMS
METALS
PARTICLE BEAMS
PLATINUM METALS
SURFACE COATING
TRANSITION ELEMENTS