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Title: Structural characterization of metastable hcp-Ni thin films epitaxially grown on Au(100) single-crystal underlayers

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3360198· OSTI ID:21476226
; ;  [1];  [2]
  1. Faculty of Science and Engineering, Chuo University, Bunkyo-ku, Tokyo 112-8551 (Japan)
  2. Graduate School of Fine Arts, Tokyo National University of Fine Arts and Music, Taito-ku, Tokyo 110-8714 (Japan)

Ni(1120) epitaxial thin films with hcp structure were prepared on Au(100) single-crystal underlayers at 100 deg. C by ultra high vacuum molecular beam epitaxy. The detailed film structure is studied by in situ reflection high energy electron diffraction, x-ray diffraction, and transmission electron microscopy. The hcp-Ni film consists of two types of variants whose c-axes are rotated around the film normal by 90 deg. each other. An atomically sharp boundary is recognized between the film and the underlayer, where misfit dislocations are introduced. Presence of such dislocations seems to relieve the strain caused by the lattice mismatch between the film and the underlayer.

OSTI ID:
21476226
Journal Information:
Journal of Applied Physics, Vol. 107, Issue 9; Conference: 11. joint MMM-Intermag conference, Washington, DC (United States), 18-22 Jan 2010; Other Information: DOI: 10.1063/1.3360198; (c) 2010 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English