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Title: Characterization of Si volume- and delta-doped InGaAs grown by molecular beam epitaxy

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3388077· OSTI ID:21476185
; ;  [1];  [2]
  1. Electronics Laboratory, ETH Zurich, 8092 Zurich (Switzerland)
  2. Institute for Quantum Electronics, ETH Zurich, 8093 Zurich (Switzerland)

Bulk InGaAs layers were grown at 400 deg. C lattice-matched to InP semi-insulating substrates by molecular beam epitaxy. Si doping of the layers was performed by applying volume- and delta-doping techniques. The samples were characterized by capacitance-voltage, van der Pauw-Hall, secondary ion mass spectroscopy and photoluminescence measurements. Good agreement in terms of dependence of mobility and Burstein-Moss shift shift on doping concentration in samples doped by the two different techniques was obtained. Amphoteric behavior of Si was observed at doping concentrations higher than {approx}2.9x10{sup 19} cm{sup -3} in both delta- and volume-doped samples. Degradation of InGaAs crystalline quality occurred in samples with Si concentrations higher than {approx}4x10{sup 19} cm{sup -3}.

OSTI ID:
21476185
Journal Information:
Journal of Applied Physics, Vol. 107, Issue 9; Other Information: DOI: 10.1063/1.3388077; (c) 2010 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English

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