On the mechanism of photoinduced refractive index changes in phosphosilicate glass

Journal Article · Wed May 26 00:00:00 EDT 2010 · Quantum Electronics (Woodbury, N.Y.)

DOI:https://doi.org/10.1070/QE2010V040N03ABEH014123· OSTI ID:21471386

Larionov, Yu V ^[1]; Sokolov, V O; Plotnichenko, V G ^[2]

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1. A M Prokhorov General Physics Institute, Russian Academy of Sciences, Moscow (Russian Federation)
2. Fiber Optics Research Center, Russian Academy of Sciences, Moscow (Russian Federation)

The photoinduced growth of the refractive index of phosphosilicate glass during Bragg grating inscription and the thermal decay of the grating have a number of unusual features. The observed index variations are interpreted in terms of a new model for photoinduced glass network rearrangement. The model assumes the formation of photoinduced voids (nanopores) in the glass network near point defects. The nanopores may migrate through the network via bond switching when the network is in a 'soft' state. The photoinduced variations in network density lead to index variations. (fibres)

• OSTI ID: 21471386
• Journal Information: Quantum Electronics (Woodbury, N.Y.), Vol. 40, Issue 3; Other Information: DOI: 10.1070/QE2010v040n03ABEH014123; ISSN 1063-7818
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
BRAGG REFLECTION
GLASS
GRATINGS
PHOSPHORUS COMPOUNDS
PHOTONS
POINT DEFECTS
REFRACTIVE INDEX
SILICATES
VARIATIONS
VOIDS
BOSONS
CRYSTAL DEFECTS
CRYSTAL STRUCTURE
ELEMENTARY PARTICLES
MASSLESS PARTICLES
OPTICAL PROPERTIES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
REFLECTION
SILICON COMPOUNDS